Sterilization mechanism for Escherichia coli by plasma flow at atmospheric pressure

被引：72
作者：
Sato, Takehiko
Miyahara, Takashi
Doi, Akiko
Ochiai, Shiroh
Urayama, Takuya
Nakatani, Tatsuyuki
机构：
[1] Tohoku Univ, Inst Fluid Sci, Aoba Ku, Sendai, Miyagi 9808577, Japan
[2] Shizuoka Univ, Fac Engn, Hamamatsu, Shizuoka 4328561, Japan
[3] Tohoku Univ, Grad Sch Engn, Aoba Ku, Sendai, Miyagi 9808577, Japan
[4] ADTEC Plasma Technol Co Ltd, Fukuyama, Hiroshima 7210942, Japan
[5] Toyo Adv Technol Co Ltd, Minami Ku, Hiroshima 7348501, Japan
来源：
APPLIED PHYSICS LETTERS | 2006年 / 89卷 / 07期
关键词：
D O I：
10.1063/1.2336594
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A mechanism for sterilizing Escherichia coli by a flowing postdischarge and UV radiation of argon plasma at atmospheric pressure was investigated by analyzing the surviving cells and the potassium leakage of cytoplasmic material and by morphological observation. Inactivation of E. coli results from the destruction of the cytoplasmic membrane and the outer membrane under plasma exposure and the destruction of nucleic acids by exposure to ultraviolet radiation from the plasma source. (c) 2006 American Institute of Physics.
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