Si-nanowire-based multistage delayed Mach-Zehnder interferometer optical MUX/DeMUX fabricated by an ArF-immersion lithography process on a 300 mm SOI wafer

被引：49
作者：
Jeong, Seok-Hwan [1 ]
Shimura, Daisuke [1 ]
Simoyama, Takasi [1 ]
Horikawa, Tsuyoshi [1 ,2 ]
Tanaka, Yu [1 ]
Morito, Ken [1 ]
机构：
[1] PETRA, Tsukuba, Ibaraki 3058569, Japan
[2] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058569, Japan
来源：
OPTICS LETTERS | 2014年 / 39卷 / 13期
关键词：
FILTERS; WDM;
D O I：
10.1364/OL.39.003702
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We report good phase controllability and high production yield in Si-nanowire-based multistage delayed Mach-Zehnder interferometer-type optical multiplexers/demultiplexers (MUX/DeMUX) fabricated by an ArF-immersion lithography process on a 300 mm silicon-on-insulator (SOI) wafer. Three kinds of devices fabricated in this work exhibit clear 1 x 4 Ch wavelength filtering operations for various optical frequency spacing. These results are promising for their applications in high-density wavelength division multiplexing-based optical interconnects. (C) 2014 Optical Society of America
引用
收藏
页码：3702 / 3705
页数：4
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