Passive Properties of Magnetron-Sputtered CrN Film on AISI 304 Stainless Steel

被引：6
作者：
Gao, Shujun [1 ]
Dong, Chaofang [1 ]
Cheng, Xuequn [1 ]
Xiao, Kui [1 ]
Wang, Lei [1 ]
Li, Xiaogang [1 ]
机构：
[1] Univ Sci & Technol Beijing, Ctr Corros & Protect, Inst Adv Mat & Technol, Beijing 100083, Peoples R China
来源：
CORROSION | 2014年 / 70卷 / 06期
基金：
中国国家自然科学基金;
关键词：
absorption; CrN; defects diffusion; electrochemical behavior; growth kinetics; passive film; 316L STAINLESS-STEEL; POINT-DEFECT MODEL; SEMICONDUCTING PROPERTIES; ELECTROCHEMICAL-BEHAVIOR; CORROSION BEHAVIOR; TRIBOLOGICAL PROPERTIES; MULTILAYER COATINGS; BIPOLAR PLATE; IN-SITU; CHROMIUM;
D O I：
10.5006/1148
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The passive properties of chromium nitride (CrN) film deposited on AISI 304 stainless steel (UNS S30400) by magnetron sputtering were investigated using a series of electrochemical techniques. The results showed that the passive film followed the 3D grain growth. The nucleation type was instantaneous while it deviated to progressive gradually with the increase of sodium chloride (NaCl) content. The thickness of the passive film was 1.1 nm to 2.4 nm with the compositions mainly of Cr, CrN, chromic oxide (Cr2O3), chromic hydroxide (Cr(OH)3), and chromium trioxide (CrO3). With the increase of film formation potential, the vacancy density decreased exponentially. The obtained diffusion coefficient of defects was 5.493x10(-17) cm(2)/s. Chromium cation in the CrN cation site also participated in the growth of passive film. Anions (Cl-) could adsorb on the passive surface in the free corrosion potential condition.
引用
收藏
页码：627 / 635
页数：9
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