Influence of gate-to-source and gate-to-drain recesses on GaAs camel-like gate field-effect transistors

被引:0
|
作者
Tsai, Jung-Hui [1 ]
Wu, You-Ren [1 ]
Chiang, Chung-Cheng [1 ]
Wang, Fu-Min [1 ]
Liu, Wen-Chau [2 ]
机构
[1] Natl Kaohsiung Normal Univ, Dept Elect Engn, Kaohsiung 116, Taiwan
[2] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 701, Taiwan
关键词
GaAs; Gate Voltage; Drain Current; Energy Band Diagram; Gate Positive Bias;
D O I
10.1134/S106378261409022X
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In this article, the characteristics of the GaAs homojunction camel-like gate field-effect transistors with and without the gate-to-source and gate-to-drain recesses structures are first investigated and compared. As to the device without the recesses structure, a second channel within the n (+)-GaAs cap layer is formed at large gate bias, which could enhance the drain output current and transconductance. Furthermore, a two-stage relationship between drain current (and transconductance) versus gate voltage is observed in the recesses structure. The simulated results exhibit a maximum drain saturation current of 447 (351 mA/mm) and a maximum transconductance of 525 (148 mS/mm) in the studied device without (with) the recesses structure. Consequentially, the demonstration and comparison of the variable structures provide a promise for design in circuit applications.
引用
收藏
页码:1222 / 1225
页数:4
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