Monte Carlo simulations of film growth

被引:12
|
作者
Landau, DP [1 ]
Pal, S [1 ]
Shim, Y [1 ]
机构
[1] Univ Georgia, Ctr Simulat Phys, Athens, GA 30602 USA
基金
美国国家科学基金会;
关键词
D O I
10.1016/S0010-4655(99)00350-1
中图分类号
TP39 [计算机的应用];
学科分类号
081203 ; 0835 ;
摘要
The growth of thin films represents an important topic in non-equilibrium phenomena, an area in which our understanding is still immature. Simple lattice models for film growth have been proposed in which both deposition and diffusion are included in different ways. We shall describe Monte Carlo and Kinetic Monte Carlo simulations of diverse lattice models for film growth, including models for molecular beam epitaxy and the Edwards-Wilkinson model, and present characteristic results for the asymptotic surface roughening behavior. The difficulties in the interpretation of the data and dynamic finite size scaling analyzes will be described, and surprises will be highlighted. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:341 / 346
页数:6
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