Investigation of carbon-doped base materials grown by CBE for Al-free InPHBTs

被引:9
作者
Benchimol, JL
Mba, J
Sermage, B
Riet, M
Blayac, S
Berdaguer, P
Duchenois, AM
André, P
Thuret, J
Gonzalez, C
Konczykowska, A
机构
[1] CNET, Lab Bagneux, DTD, France Telecom, F-92225 Bagneux, France
[2] OPTO, Groupement Interet Econ, F-91460 Marcoussis, France
关键词
chemical beam epitaxy; doping; heterojunction bipolar transistor; digital circuit;
D O I
10.1016/S0022-0248(99)00601-6
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
InGaAs/InP heterojunction bipolar transistors with a carbon-doped base are shown to have lower gain that those with a Be-doped base. In order to keep advantage of the low diffusivity of the carbon dopant, alternative carbon-doped materials have been tested as the base material. A quaternary InGaAsP alloy with a lower band gap than InGaAs to reduce Auger recombination proved to be unsatisfactory, because of low doping (<2 x 10(19) cm(-3)) and dramatically lower electron lifetime than in InGaAs. The compositionally graded base proved to be an attractive solution, allowing significantly improved gain in HBTs, and leading to some advantageous side effects, such as higher doping level, constant gain over large current range, and higher frequencies. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:476 / 480
页数:5
相关论文
共 21 条
  • [1] EFFECT OF BASE DOPANT SPECIES ON HETEROJUNCTION BIPOLAR-TRANSISTOR RELIABILITY
    ABERNATHY, CR
    REN, F
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1994, 28 (1-3): : 232 - 237
  • [2] Recombination lifetime of In0.53Ga0.47As as a function of doping density
    Ahrenkiel, RK
    Ellingson, R
    Johnston, S
    Wanlass, M
    [J]. APPLIED PHYSICS LETTERS, 1998, 72 (26) : 3470 - 3472
  • [3] ANDRE P, 1999, BIP BICMOS CIRC TECH
  • [4] CBE growth of carbon doped InGaAs/InP HBTs for 25 Gbit/s circuits
    Benchimol, JL
    Mba, J
    Duchenois, AM
    Sermage, B
    Launay, P
    Caffin, D
    Meghelli, M
    Juhel, M
    [J]. JOURNAL OF CRYSTAL GROWTH, 1998, 188 (1-4) : 349 - 354
  • [5] Benefits of chemical beam epitaxy for micro and optoelectronic applications
    Benchimol, JL
    Alexandre, F
    Lamare, B
    Legay, P
    [J]. PROGRESS IN CRYSTAL GROWTH AND CHARACTERIZATION OF MATERIALS, 1996, 33 (04): : 473 - 495
  • [6] VERY HIGH-GAIN IN CARBON-DOPED BASE HETEROJUNCTION BIPOLAR-TRANSISTOR GROWN BY CHEMICAL BEAM EPITAXY
    BENCHIMOL, JL
    ALEXANDRE, F
    DUBONCHEVALLIER, C
    HELIOT, F
    BOURGUIGA, R
    DANGLA, J
    SERMAGE, B
    [J]. ELECTRONICS LETTERS, 1992, 28 (14) : 1344 - 1345
  • [7] BENCHIMOL JL, 1999, P 11 INT C INP REL M, P559
  • [8] Chellic C., 1999, Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362), P127, DOI 10.1109/ICIPRM.1999.773651
  • [9] p- and n-type carbon doping of InxGa1-xAsyP1-y alloys lattice matched to InP
    Cohen, GM
    Benchimol, JL
    LeRoux, G
    Legay, P
    Sapriel, J
    [J]. APPLIED PHYSICS LETTERS, 1996, 68 (26) : 3793 - 3795
  • [10] Improved stability of C-doped GaAs grown by chemical beam epitaxy for heterojunction bipolar transistor applications
    Driad, R
    Alexandre, F
    Benchimol, JL
    Jusserand, B
    Sermage, B
    Juhel, M
    Launay, P
    [J]. JOURNAL OF CRYSTAL GROWTH, 1996, 158 (03) : 210 - 216