Directed Self-assembly of Topcoat-free, Integration-friendly High-χ Block Copolymers

被引：5

作者：

Vora, Ankit ^{[1
]}

Chunder, Anindarupa ^{[1
]}

Tjio, Melia ^{[1
]}

Balakrishman, Srinivasan ^{[1
]}

Lofano, Elizabeth ^{[1
]}

Cheng, Joy ^{[1
]}

Sanders, Daniel P. ^{[1
]}

Hirahara, Eri ^{[2
]}

Akiyama, Yasushi ^{[2
]}

Polishchuk, Orest ^{[3
]}

Paunescu, Margareta ^{[3
]}

Baskaran, Durairaj ^{[3
]}

Hong, SungEun ^{[3
]}

Lin, Guanyang ^{[3
]}

机构：

[1] IBM Res Almaden, San Jose, CA 95120 USA

[2] AZ Elect Mat Mfg Japan KK, Shizuoka 4371412, Japan

[3] AZ Elect Mat USA Corp, Somerville, NJ 08876 USA

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2014年 / 27卷 / 04期

关键词：

Directed self-assembly; organic high-chi block copolymers; topcoat-free; perpendicular lamellae and cylinders; THIN-FILMS; ORIENTATION; LITHOGRAPHY; DOMAINS; BULK;

D O I：

10.2494/photopolymer.27.419

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

To extend the scaling beyond the most widely used poly(styrene-b-methyl methacrylate) (PS-b-PMMA), organic high-chi block copolymers (BCPs) were developed. Vertically oriented BCP domains were obtained by simple coat and bake process without application of an additional layer of a topcoat material. In addition, process-friendly conditions including low bake temperature (<200 degrees C) and short bake time (<= 5 min) provided a simple scheme to integrate these high-chi block copolymers to standard lithography process and pre-patterns defined by 193i lithography. Successful demonstration of directed self-assembly of these high-chi block copolymers on 193i-defined guiding pre-patterns offers a simple route to access well-aligned perpendicular lamellae and cylinders with a pitch less than 20 nm.

引用

页码：419 / 424

页数：6

共 15 条

[1] Polarity-Switching Top Coats Enable Orientation of Sub-10-nm Block Copolymer Domains
Bates, Christopher M.
Seshimo, Takehiro
Maher, Michael J.
Durand, William J.
Cushen, Julia D.
Dean, Leon M.
Blachut, Gregory
Ellison, Christopher J.
Willson, C. Grant
[J]. SCIENCE, 2012, 338 (6108) : 775 - 779
[2] Polymer self assembly in semiconductor microelectronics
Black, C. T.
Ruiz, R.
Breyta, G.
Cheng, J. Y.
Colburn, M. E.
Guarini, K. W.
Kim, H.-C.
Zhang, Y.
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 2007, 51 (05) : 605 - 633
[3] Control of self-assembly of lithographically patternable block copolymer films
Bosworth, Joan K.
Paik, Marvin Y.
Ruiz, Ricardo
Schwartz, Evan L.
Huang, Jenny Q.
Ko, Albert W.
Smilgies, Detlef-M.
Black, Charles T.
Ober, Christopher K.
[J]. ACS NANO, 2008, 2 (07) : 1396 - 1402
[4] PS-b-PHEMA: Synthesis, Characterization, and Processing of a High χ Polymer for Directed Self-Assembly Lithography
Cheng, Jing
Lawson, Richard A.
Yeh, Wei-Ming
Jarnagin, Nathan D.
Peters, Andrew
Tolbert, Laren M.
Henderson, Clifford L.
[J]. ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES V, 2013, 8680
[5] Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist
Cheng, Joy Y.
Sanders, Daniel P.
Truong, Hoa D.
Harrer, Stefan
Friz, Alexander
Holmes, Steven
Colburn, Matthew
Hinsberg, William D.
[J]. ACS NANO, 2010, 4 (08) : 4815 - 4823
[6] Thin Film Self-Assembly of Poly(trimethylsilylstyrene-b-D,L-lactide) with Sub-10 nm Domains
Cushen, Julia D.
Bates, Christopher M.
Rausch, Erica L.
Dean, Leon M.
Zhou, Sunshine X.
Willson, C. Grant
Ellison, Christopher J.
[J]. MACROMOLECULES, 2012, 45 (21) : 8722 - 8728
[7] Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films
Ji, Shengxiang
Liu, Chi-Chun
Son, Jeong Gon
Gotrik, Kevin
Craig, Gordon S. W.
Gopalan, Padma
Himpsel, F. J.
Char, Kookheon
Nealey, Paul F.
[J]. MACROMOLECULES, 2008, 41 (23) : 9098 - 9103
[8] Control of the Orientation of Symmetric Poly(styrene)-block-poly(D,L-lactide) Block Copolymers Using Statistical Copolymers of Dissimilar Composition
Keen, Imelda
Yu, Anguang
Cheng, Han-Hao
Jack, Kevin S.
Nicholson, Timothy M.
Whittaker, Andrew K.
Blakey, Idriss
[J]. LANGMUIR, 2012, 28 (45) : 15876 - 15888
[9] Decoupling Bulk Thermodynamics and Wetting Characteristics of Block Copolymer Thin Films
Kim, Sangwon
Nealey, Paul F.
Bates, Frank S.
[J]. ACS MACRO LETTERS, 2012, 1 (01): : 11 - 14
[10] Synthesis of Semicrystalline/Fluorinated Side-Chain Crystalline Block Copolymers and Their Bulk and Thin Film Nanoordering
Li, Hong
Gu, Weiyin
Li, Le
Zhang, Yongming
Russell, Thomas P.
Coughlin, E. Bryan
[J]. MACROMOLECULES, 2013, 46 (10) : 3737 - 3745

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