Ta and Nb Electrodeposition from Ionic Liquids

被引：13

作者：

Krischok, S. ^{[1
]}

Ispas, A. ^{[2
]}

Zuehlsdorff, A. ^{[1
]}

Ulbrich, A. ^{[1
]}

Bund, A. ^{[2
]}

Endres, F. ^{[3
]}

机构：

[1] Tech Univ Ilmenau, Inst Phys, Weimarer Str 25, D-98693 Ilmenau, Germany

[2] Tech Univ Ilmenau, Fachgebiet Elektrochem & Galvanotechnik, D-98693 Ilmenau, Germany

[3] Tech Univ Clausthal, Inst Particle Technol, Chair Interface Proc, D-38678 Clausthal Zellerfeld, Germany

来源：

MOLTEN SALTS AND IONIC LIQUIDS 18 | 2012年 / 50卷 / 11期

关键词：

IN-VACUO; SPECTROSCOPY; SURFACE; XPS;

D O I：

10.1149/05011.0229ecst

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

We have investigated the electrodeposition of tantalum and niobium from the two ionic liquids (ILs) 1-butyl-1-methyl-pyrrolidinium bis(trifluoromethylsulfonyl) amide and 1-methyl-3-propyl imidazolium bis(trifluoromethylsulfonyl) amide. The characterization of the deposited metal films is accompanied by an analysis of the chemical composition of the neat ILs as well as the ILs with dissolved TaF5 and NbF5 using X-ray photoelectron spectroscopy. Furthermore cyclic voltammograms provide further information on the reduction mechanism.

引用

页码：229 / 237

页数：9

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