Power stability of AlGaN/GaN HFETs at 20 W/mm in the pinched-off operation mode

被引:19
作者
Koudymov, A. [1 ]
Wang, C. X. [1 ]
Adivarahan, V. [1 ]
Yang, J. [1 ]
Simin, G. [1 ]
Khan, M. Asif [1 ]
机构
[1] Univ S Carolina, Dept Elect Engn, Columbia, SC 29208 USA
关键词
efficiency; GaN-AlGaN; heterostructure field-effect transistor (HFET); HEMT; insulated-gate HFET; metal-oxide-semiconductor HFET (MOSHFET); microwave power; reliability;
D O I
10.1109/LED.2006.887642
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High power-added efficiency (PAE) (approximate to 74%) and r f-power (20 W/mm) operation of Schottky and,insulated-gate AlGaN/GaN heterostructure field-effect transistors (HFETs) is reported at 2 GHz. In the pinched-off mode of operation, the PAE increases from a value of 55% to 74% when the drain bias is changed from 35 to 60 V. While both the Schottky and the insulated HFETs show high powers and PAE values, only the insulated-gate devices are stable at 20-W/mm output powers during a 60-h continuous wave r f-stress test. Their power drop of less than 0.1 dB is much smaller than the 0.8-dB drop for identical geometry Schottky-gate HFETs. The superior stability of the insulated-gate HFETs is attributed to the low forward gate currents.
引用
收藏
页码:5 / 7
页数:3
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