The effect of different scanning schemes on target and film properties in pulsed laser deposition of bismuth

被引：9

作者：

Jacquot, A ^{[1
]}

Boffoué, MO ^{[1
]}

Lenoir, B ^{[1
]}

Dauscher, A ^{[1
]}

机构：

[1] Ecole Mines, UHP, INPL, UMR CNRS 7556,Lab Phys Mat, F-54042 Nancy, France

来源：

APPLIED SURFACE SCIENCE | 2000年 / 156卷 / 1-4期

关键词：

bismuth; pulsed laser deposition; laser beam scanning; scanning electron microscopy; thickness profiles;

D O I：

10.1016/S0169-4332(99)00505-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Thin bismuth films have been prepared on glass substrates at room temperature by pulsed laser deposition with a Nd:YAG laser working at a wavelength of 532 nm, The influence of both target diameter and the way of scanning the laser beam over the target surface on the film quality (droplet density and film thickness homogeneity) was studied. Scanning electron microscopy and thickness profile analyses were performed on the films. Three different laser beam scanning schemes have been simulated and tested. Films of high quality are obtained using the highest possible target area eroded in the most homogeneous way. This was achieved with an appropriate scanning of the laser beam over the target, for instance with a 'crenel' like scanning or with a scanning at varying speed. Results are discussed in relation to target roughness. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：169 / 176

页数：8

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