SbSe/ZnSb stacked thin films with multi-level phase transition for high density phase change memory applications

被引:7
作者
Zhao, Zihan [1 ]
Hua, Sicong [1 ]
Shen, Bo [1 ]
Zhai, Jiwei [1 ]
Lai, Tianshu [2 ]
Song, Sannian [3 ]
Song, Zhitang [3 ]
机构
[1] Tongji Univ, Sch Mat Sci & Engn, Shanghai Key Lab R&D & Applicat Metall Funct Mat, Shanghai 201804, Peoples R China
[2] Sun Yat Sen Univ, Dept Phys, State Key Lab Optoelect Mat & Technol, Guangzhou 510275, Guangdong, Peoples R China
[3] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
基金
中国国家自然科学基金;
关键词
CRYSTALLIZATION; SPEED; BEHAVIOR;
D O I
10.1007/s10854-019-01875-z
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
As a highly integrated non-volatile memory device, phase change memory (PCM) has attracted considerable attention. In this paper, SbSe/ZnSb (SS/ZS) stacked thin films were developed for high density phase change memory applications. SS/ZS stacked thin films show two pronounced resistance steps with the increase in temperature and possess excellent thermal stability. The X-ray diffraction reveals that Sb, Sb2Se3 phases crystallize first, hexagonal ZnSb phase forms then at higher temperatures. The stacked thin films exhibit subtle variations in thickness and roughness after crystallization. Ultrafast crystallization speed (9.68 ns) in the SS(25 nm)/ZS(25 nm) thin film was validated by picosecond laser pump-probe system. Phase-change memory cells based on SS(25 nm)/ZS(25 nm) stacked thin film can realize multi-level data storage and the whole SET and RESET operations can be implemented with a 20 ns electrical pulse. Thus, SS/ZS stacked thin films have advantages for multi-level data storage capability, better thermal stability, and fast phase change speed, and are therefore good candidates for high density PCM device.
引用
收藏
页码:15024 / 15030
页数:7
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