Properties of SnO2 films prepared by DC and MF reactive sputtering

被引：0

作者：

Ruske, M ^{[1
]}

Bräuer, G ^{[1
]}

Pistner, J ^{[1
]}

Pfäfflin, U ^{[1
]}

Szczyrbowski, J ^{[1
]}

机构：

[1] Leybold Syst GmbH, D-63450 Hanau, Germany

来源：

2ND INTERNATIONAL CONFERENCE ON COATINGS ON GLASS, ICCG: HIGH-PERFORMANCE COATINGS FOR TRANSPARENT SYSTEMS IN LARGE-AREA AND/OR HIGH-VOLUME APPLICATIONS | 1999年

关键词：

optical coatings; sputtering; tin oxide;

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

By applying medium frequency (MF) powered twin magnetron arrangements, typical problems of reactive direct current (DC) sputter deposition of electrically insulating materials can be solved. Inherent properties of this new deposition method are a high ion bombardment of the substrate during deposition and the possibility to deposit transparent layers in the transition mode of the cathode characteristic. This leads to modified film properties compared to the DC method. This is shown here for the case of SnO2.

引用

页码：228 / 232

页数：5

共 5 条

[1] Mid frequency sputtering - a novel tool for large area coating [J].