Electroluminescence from Si nanostructure-based silicon nitride light-emitting devices

被引:1
作者
Lin Zhen-Xu [1 ]
Lin Ze-Wen [1 ]
Zhang Yi [1 ]
Song Chao [2 ]
Guo Yan-Qing [2 ]
Wang Xiang [2 ]
Huang Xin-Tang [1 ]
Huang Rui [1 ,2 ]
机构
[1] Cent China Normal Univ, Inst Nanosci & Nanotechnol, Wuhan 430079, Peoples R China
[2] Hanshan Normal Univ, Dept Phys & Elect Engn, Chaozhou 521041, Peoples R China
基金
中国国家自然科学基金;
关键词
nc-Si; silicon nitride; electroluminescence;
D O I
10.7498/aps.63.037801
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Dense Si nanostructures embedded in silicon nitride prepared by plasma- enhanced chemical vapor deposition (PECVD) was used as luminescence active layer to fabricate light-emitting diodes based on p-Si/SiN-based emitter/AZO structure. Visible electroluminescence from the device was observed at room temperature. It is found that the electroluminescence intensity of the device can be further enhanced significantly by inserting an ultrathin nanocrystalline Si layer between the p-Si substrate and SiN-based emitter as a hole barrier layer. Moreover, the electroluminescence efficiency is increased by more than 80% as compared to the decice without the nc-Si barrier layer.
引用
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页数:4
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