Transition between the 1 x 1 and (√3 x 2√3)R30° surface structures of GaN in the vapor-phase environment

被引:10
作者
Munkholm, A
Thompson, C
Stephenson, GB
Eastman, JA
Auciello, O
Fini, P
Speck, JS
DenBaars, SP
机构
[1] Argonne Natl Lab, Div Chem, Argonne, IL 60439 USA
[2] No Illinois Univ, Dept Phys, De Kalb, IL 60115 USA
[3] Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA
[4] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
基金
美国国家科学基金会;
关键词
GaN; surface reconstruction; MOCVD; phase transition; X-ray scattering;
D O I
10.1016/S0921-4526(99)01964-X
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Out-of-plane structures of the GaN(0001) surface in the metal-organic chemical vapor deposition (MOCVD) environment have been determined using in situ grazing-incidence X-ray scattering. We measured 11 (2) over bar l crystal truncation rod intensities at a variety of temperatures and ammonia partial pressures on both sides of the 1 x 1 to (root 3 x 2 root 3)R30 degrees surface phase transition. The out-of-plane structure of the (root 3 x 2 root 3)R30 degrees phase appears to be nearly independent of temperature below the transition, while the structure of the 1 x 1 phase changes increasingly rapidly as the phase transition is approached from above. A model for the structure of the 1 x 1 phase with a partially occupied top Ga layer agrees well with the data. The observed temperature dependence is consistent with a simple model of the equilibrium between the vapor phase and the surface coverage of Ga and N. In addition, we present results on the kinetics of reconstruction domain coarsening following a "quench" into the (root 3 x 2 root 3)R30 degrees phase held. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:217 / 222
页数:6
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