Structure and Properties of SiOx Films Prepared by Chemical Etching of Amorphous Alloy Ribbons

被引：1

作者：

Fedorov, V. A. ^{[1
]}

Berezner, A. D. ^{[1
]}

Beskrovnyi, A. I. ^{[2
]}

Fursova, T. N. ^{[3
]}

Pavlikov, A. V. ^{[4
]}

Bazhenov, A. V. ^{[3
]}

机构：

[1] Tambov State Univ, Tambov 392000, Russia

[2] Joint Inst Nucl Res, Dubna 141980, Moscow Region, Russia

[3] Russian Acad Sci, Inst Solid State Phys, Chernogolovka 142432, Moscow Region, Russia

[4] Moscow MV Lomonosov State Univ, Moscow 119991, Russia

来源：

PHYSICS OF THE SOLID STATE | 2018年 / 60卷 / 04期

基金：

俄罗斯基础研究基金会;

关键词：

OPTICAL-PROPERTIES; THIN-FILMS; SPECTROSCOPY; COATINGS;

D O I：

10.1134/S1063783418040091

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The structure and the physical properties of amorphous SiOx films prepared by chemical etching of an iron-based amorphous ribbon alloy have been studied. The neutron diffraction and also the atomicforce and electron microscopy show that the prepared visually transparent films have amorphous structure, exhibit dielectric properties, and their morphology is similar to that of opals. The samples have been studied by differential scanning calorimetry, Raman and IR spectroscopy before and after their heat treatment. It is found that annealing of the films in air at a temperature of 1273 K leads to a change in their chemical compositions: an amorphous SiO2 compound with inclusions of SiO2 nanocrystals (crystobalite) forms.

引用

页码：705 / 709

页数：5

共 17 条

[1] Optical Properties of Thin Films of Closely Packed SiO2 Spheres [J].