Carbon and Tungsten Sputtering in a Helium Magnetron Discharge

被引：5

作者：

Tiron, Vasile ^{[1
]}

Andrei, Codrin ^{[1
]}

Nastuta, Andrei V. ^{[1
]}

Rusu, George B. ^{[1
]}

Vitelaru, Catalin ^{[1
]}

Popa, Gheorghe ^{[1
]}

机构：

[1] Alexandru Ioan Cuza Univ, Fac Phys, Dept Plasma Phys, Iasi 700506, Romania

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 2009年 / 37卷 / 08期

关键词：

Carbon; magnetrons; sputtering; tungsten; ASDEX UPGRADE; FILMS; DEPOSITION;

D O I：

10.1109/TPS.2009.2024421

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

This paper reports on carbon and tungsten deposition on a heated silicon substrate under He(+) bombardment in a magnetron-sputtering device. The discharge was operated at constant pressure of 1.33 Pa for two discharge-current intensities (200 and 600 mA) and target power density up to 40 W . cm(-2). The deposited films were characterized by scanning electron microscopy, atomic force microscopy, and X-ray diffractometry. The topography and cross section revealed the influence of the target power density on the surface roughness, grains' size, and thickness of the deposited films.

引用

页码：1581 / 1585

页数：5

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