Carbon and Tungsten Sputtering in a Helium Magnetron Discharge

被引：5
|
作者：
Tiron, Vasile [1 ]
Andrei, Codrin [1 ]
Nastuta, Andrei V. [1 ]
Rusu, George B. [1 ]
Vitelaru, Catalin [1 ]
Popa, Gheorghe [1 ]
机构：
[1] Alexandru Ioan Cuza Univ, Fac Phys, Dept Plasma Phys, Iasi 700506, Romania
来源：
IEEE TRANSACTIONS ON PLASMA SCIENCE | 2009年 / 37卷 / 08期
关键词：
Carbon; magnetrons; sputtering; tungsten; ASDEX UPGRADE; FILMS; DEPOSITION;
D O I：
10.1109/TPS.2009.2024421
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
This paper reports on carbon and tungsten deposition on a heated silicon substrate under He(+) bombardment in a magnetron-sputtering device. The discharge was operated at constant pressure of 1.33 Pa for two discharge-current intensities (200 and 600 mA) and target power density up to 40 W . cm(-2). The deposited films were characterized by scanning electron microscopy, atomic force microscopy, and X-ray diffractometry. The topography and cross section revealed the influence of the target power density on the surface roughness, grains' size, and thickness of the deposited films.
引用
收藏
页码：1581 / 1585
页数：5
相关论文
共 50 条
  • [1] On the carbon and tungsten sputtering rate in a magnetron discharge
    Tiron, V.
    Dobrea, S.
    Costin, C.
    Popa, G.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2009, 267 (02) : 434 - 437
  • [2] Morphological Changes of Tungsten Surfaces by Low-Flux Helium Plasma Treatment and Helium Incorporation via Magnetron Sputtering
    Iyyakkunnel, Santhosh
    Marot, Laurent
    Eren, Baran
    Steiner, Roland
    Moser, Lucas
    Mathys, Daniel
    Dueggelin, Marcel
    Chapon, Patrick
    Meyer, Ernst
    ACS APPLIED MATERIALS & INTERFACES, 2014, 6 (14) : 11609 - 11616
  • [3] Deuterium retention in carbon and tungsten-carbon mixed films deposited by magnetron sputtering in D2 atmosphere
    Alimov, VK
    Komarov, DA
    JOURNAL OF NUCLEAR MATERIALS, 2003, 313 : 599 - 603
  • [4] Modeling of high power impulse magnetron sputtering discharges with tungsten target
    Babu, Swetha Suresh
    Rudolph, Martin
    Lundin, Daniel
    Shimizu, Tetsuhide
    Fischer, Joel
    Raadu, Michael A.
    Brenning, Nils
    Gudmundsson, Jon Tomas
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2022, 31 (06)
  • [5] Dynamic Behavior of sputtering of tungsten implanted in carbon
    Ohya, K
    Kawakami, R
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2001, 40 (12): : 6965 - 6971
  • [6] Manufacturing of magnetron sputtering tungsten coatings and irradiation damage behavior under helium plasma exposure
    Xu, Yun -Feng
    Xu, Yue
    Luo, Lai-Ma
    Zan, Xiang
    Wu, Yu-Cheng
    VACUUM, 2022, 205
  • [7] Sputtering of mixed materials of beryllium and tungsten by hydrogen and helium
    Mutzke, A.
    Bandelow, G.
    Schneider, R.
    JOURNAL OF NUCLEAR MATERIALS, 2015, 467 : 413 - 417
  • [8] Material Mixing of Tungsten with Carbon and Helium
    Ueda, Y.
    Lee, H. T.
    PLASMA INTERACTION IN CONTROLLED FUSION DEVICES, 2010, 1237 : 92 - 105
  • [9] Nanostructure growth by helium plasma irradiation to tungsten in sputtering regime
    Noiri, Y.
    Kajita, S.
    Ohno, N.
    JOURNAL OF NUCLEAR MATERIALS, 2015, 463 : 285 - 288
  • [10] Magnetron sputtering of carbon supersaturated tungsten films-A chemical approach to increase strength
    Fritze, S.
    Chen, M.
    Riekehr, L.
    Osinger, B.
    Sortica, M. A.
    Srinath, A.
    Menon, A. S.
    Lewin, E.
    Primetzhofer, D.
    Wheeler, J. M.
    Jansson, U.
    MATERIALS & DESIGN, 2021, 208
12345