Tuning Electronic Structure of Single Layer MoS2 through Defect and Interface Engineering

被引:234
作者
Chen, Yan [1 ,2 ,11 ]
Huang, Shengxi [3 ,6 ]
Ji, Xiang [2 ]
Adepalli, Kiran [2 ]
Yin, Kedi [7 ]
Ling, Xi [3 ,9 ,10 ]
Wang, Xinwei [8 ]
Xue, Jianmin [7 ]
Dresselhaus, Mildred [3 ,4 ]
Kong, Jing [2 ,3 ]
Yildiz, Bilge [1 ,5 ]
机构
[1] MIT, Dept Nucl Sci & Engn, 77 Massachusetts Ave, Cambridge, MA 02139 USA
[2] MIT, Elect Res Lab, Cambridge, MA 02139 USA
[3] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA
[4] MIT, Dept Phys, Cambridge, MA 02139 USA
[5] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[6] Penn State Univ, Dept Elect Engn, University Pk, PA 16802 USA
[7] Peking Univ, Sch Phys, State Key Lab Nucl Phys & Technol, Beijing 100871, Peoples R China
[8] Peking Univ, Shenzhen Grad Sch, Sch Adv Mat, Shenzhen 518055, Peoples R China
[9] Boston Univ, Dept Chem, Div Engn & Mat Sci, 590 Commonwealth Ave, Boston, MA 02215 USA
[10] Boston Univ, Photon Ctr, Boston, MA 02215 USA
[11] South China Univ Technol, Guangzhou Key Lab Surface Chem Energy Mat, New Energy Res Inst, Sch Environm & Energy, Guangzhou, Guangdong, Peoples R China
关键词
transition-metal dichalcogenides; hydrogen evolution reaction; ion irradiation; X-ray photoelectron spectroscopy; Raman spectroscopy; scanning tunneling microscopy; TOTAL-ENERGY CALCULATIONS; LARGE-AREA; GRAPHENE FILMS; BORON-NITRIDE; MONOLAYER; BANDGAP; STATES; GAP; XPS;
D O I
10.1021/acsnano.7b08418
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Transition-metal dichalcogenides (TMDs) have emerged in recent years as a special group of two-dimensional materials and have attracted tremendous attention. Among these TMD materials, molybdenum disulfide (MoS2) has shown promising applications in electronics, photonics, energy, and electrochemistry. In particular, the defects in MoS2 play an essential role in altering the electronic, magnetic, optical, and catalytic properties of MoS2, presenting a useful way to engineer the performance of MoS2. The mechanisms by which lattice defects affect the MoS2 properties are unsettled. In this work, we reveal systematically how lattice defects and substrate interface affect MoS2 electronic structure. We fabricated single-layer MoS2 by chemical vapor deposition and then transferred onto Au, single-layer graphene, hexagonal boron nitride, and CeO2 as substrates and created defects in MoS2 by ion irradiation. We assessed how these defects and substrates affect the electronic structure of MoS2 by performing X-ray photoelectron spectroscopy, Raman and photoluminescence spectroscopies, and scanning tunneling microscopy/spectroscopy measurements. Molecular dynamics and first-principles based simulations allowed us to conclude the predominant lattice defects upon ion irradiation and associate those with the experimentally obtained electronic structure. We found that the substrates can tune the electronic energy levels in MoS2 due to charge transfer at the interface. Furthermore, the reduction state of CeO2 as an oxide substrate affects the interface charge transfer with MoS2. The irradiated MoS2 had a faster hydrogen evolution kinetics compared to the as-prepared MoS2, demonstrating the concept of defect controlled reactivity in this phase. Our findings provide effective probes for energy band and defects in MoS2 and show the importance of defect engineering in tuning the functionalities of MoS2 and other TMDs in electronics, optoelectronics, and electrochemistry.
引用
收藏
页码:2569 / 2579
页数:11
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