Reductive patterning of graphene oxide by vacuum-ultraviolet irradiation in high vacuum

被引：11

作者：

Tu, Yudi ^{[1
]}

Ichii, Takashi ^{[1
]}

Khatri, Om Prakash ^{[2
]}

Sugimura, Hiroyuki ^{[1
]}

机构：

[1] Kyoto Univ, Grad Sch Engn, Dept Mat Sci & Engn, Kyoto 6068501, Japan

[2] CSIR, Indian Inst Petr, Div Chem Sci, Dehra Dun 248005, Uttar Pradesh, India

来源：

APPLIED PHYSICS EXPRESS | 2014年 / 7卷 / 07期

关键词：

SELF-ASSEMBLED MONOLAYERS; PROBE FORCE MICROSCOPY; FILMS; LITHOGRAPHY; SHEETS; LAYER;

D O I：

10.7567/APEX.7.075101

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A dry photoprocess for converting graphene oxide (GO) to reduced GO (rGO) by vacuum-ultraviolet (VUV) irradiation is reported. The rapid reduction of GO was achieved by irradiating a GO sheet in vacuum with 172 nm VUV light at a low power density of 10 mW.cm(-2). This VUV reduction photochemistry was successfully applied to photolithography by which rGO lines could be drawn on a GO microsheet at a submicrometer resolution. This method will be promising for the fabrication of graphene-based microdevices. (C) 2014 The Japan Society of Applied Physics

引用

页数：4

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