Raman scattering from Ge nanostructures grown on Si substrates: Power and limitations

被引:120
作者
Kolobov, AV
机构
[1] Natl Inst Adv Interdisciplinary Res, Joint Res Ctr Atom Technol, Tsukuba, Ibaraki, Japan
[2] Electrotech Lab, Tsukuba, Ibaraki 305, Japan
关键词
D O I
10.1063/1.372279
中图分类号
O59 [应用物理学];
学科分类号
摘要
The analysis of Raman spectra obtained for different germanium nanostructures grown on silicon substrates is presented. Comparison of these spectra with a Raman spectrum of a silicon wafer reveals a one-to-one correspondence of features located around 229, 300, and 435 cm(-1). It is argued that the peaks observed at these frequencies and often ascribed to Ge nanostructures are, in fact, coming from the Si substrate. The erroneous ascription of the peaks makes the corresponding conclusions incorrect. (C) 2000 American Institute of Physics. [S0021-8979(00)04605-3].
引用
收藏
页码:2926 / 2930
页数:5
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