Structural Transitions in Asymmetric Poly(styrene)-block-Poly(lactide) Thin Films Induced by Solvent Vapor Exposure

被引:25
作者
Sinturel, Christophe [1 ]
Grosso, David [2 ]
Boudot, Mickael [2 ]
Amenitsch, Heinz [3 ]
Hillmyer, Marc A. [4 ]
Pineau, Alain [1 ]
Vayer, Marylene [1 ]
机构
[1] CNRS Univ Orleans, Ctr Rech Mat Divisee, F-45071 Orleans 02, France
[2] Univ Paris 06, Coll France, UMR UPMC CNRS 7574, Lab Chim Matiere Condensee Paris, F-75231 Paris, France
[3] Austrian Acad Sci, Inst Biophys & Nanosyst Res, A-8042 Graz, Austria
[4] Univ Minnesota, Dept Chem, Minneapolis, MN 55455 USA
关键词
block copolymers; thin films; solvent vapor annealing (SVA); in situ GISAXS; phase transitions; BLOCK-COPOLYMER; POLYSTYRENE; CYLINDER; ORIENTATION; SPHERE;
D O I
10.1021/am504086x
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Successive structural transitions in thin films of asymmetric poly(styrene)-block-poly(lactide) (PS-PLA) block copolymer samples upon exposure to tetrahydrofuran (THF) vapors have been monitored using atomic force microscopy (AFM) and both in situ and ex situ grazing incidence small-angle X-ray scattering (GISAXS). A direct link was established between the structure in the swollen state and the morphology formed in the dried state post solvent evaporation. This was related to the high incompatibility between the constituting blocks of the copolymer that thwarted the system from reaching the homogeneous disordered state in the swollen state under the specific conditions utilized in this study. Upon rapid solvent removal, the morphologies formed in the swollen state were trapped due the fast evaporation kinetics. This work provides a better understanding of the mechanisms associated with block copolymer thin film morphology changes induced by solvent vapor annealing.
引用
收藏
页码:12146 / 12152
页数:7
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