Magnetic properties of CoWP film by electroless deposition

被引：3

作者：

Ge, H. L. ^{[1
]}

Chen, Q. ^{[1
]}

Li, L. ^{[1
]}

Wu, Q. ^{[1
]}

Jin, H. X. ^{[1
]}

Wei, G. Y. ^{[1
]}

Chu, N. J. ^{[1
]}

Wang, X. Q. ^{[1
]}

机构：

[1] China Jiliang Univ, Zhejiang Prov Key Lab Magnetism, Coll Mat Sci & Engn, Hangzhou 310018, Peoples R China

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2009年 / 471卷 / 1-2期

基金：

中国国家自然科学基金;

关键词：

CoWP; Magnetic films; Microstructure; Magnetic property; METALLIZATION; PARTICLES;

D O I：

10.1016/j.jallcom.2008.04.010

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

CoWP magnetic films on aluminum substrates were prepared by electroless deposition in alkaline solution, and then the microstructure, the element composition and the surface topography of CoWP films were characterized by XRD and FESEM equipped with EDX. The influence of the prepared conditions on microstructure and magnetic properties of CoWP films was mainly discussed, which the magnetic properties of CoWP films could be optimized with saturation magnetization of 85 emu/g and coercive force of 300 Oe. The results indicated W and P in the form of an amorphous phase enriched in the Co grain boundaries and the as-prepared CoWP films was mainly hcp Co phase with the diameter of 2-3 mu m. Furthermore, the exchange coupling effect was confirmed by the Henkel (delta M) curve, which caused to the remanence enhancement. (c) 2008 Elsevier B.V. All rights reserved.

引用

页码：515 / 518

页数：4

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