Investigation of Metallic/Oxide Interfaces in Pt/Co/AlOx Trilayers by Hard X-Ray Reflectivity

被引:2
作者
Fettar, F. [1 ,2 ]
Garad, H. [1 ,2 ]
Ortega, L. [1 ,2 ]
Ramos, A. Y. [1 ,2 ]
Zawilski, B. [1 ,2 ]
Plaindoux, P. [1 ,2 ]
Auffret, S. [3 ]
Rodmacq, B. [3 ]
Dieny, B. [3 ]
机构
[1] CNRS, Inst Neel, F-38042 Grenoble 9, France
[2] Univ Grenoble 1, F-38042 Grenoble 9, France
[3] CEA, INAC SPINTEC, CNRS, URA 2512, F-38054 Grenoble 9, France
关键词
Magnetic layered films; metal-insulator structures; oxidation; perpendicular magnetic anisotropy; reflectometry; simulation; X-ray chemical analysis; X-ray measurements;
D O I
10.1109/TMAG.2009.2021670
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
X-ray reflectivity (XRR) is used to determine the oxidation front at the nanometer scale in sputtered perpendicular semi tunnel junctions, as the form Pt/Co/AlOx, by varying the oxidation time t(Ox) of the capping layer. From XRR simulations, we show that the nature of the stack is gradually defined according to the value of t(Ox). For low t(Ox) values (< 40 s), a simple Pt/Co/Al/AlOx multilayer is appearing whereas a Pt/Co/CoO/AlOx architecture takes place for higher t(Ox). The oxygen-induced magnetic properties obtained by extraordinary Hall effects measurements are explained by the structural results. The increase of Co-O bondings with t(Ox) is at the origin of the appearing of the perpendicular magnetic anisotropy (PMA).
引用
收藏
页码:3905 / 3908
页数:4
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