Compatibility of the low-dielectric-constant poly(arylether) with the electroless copper deposition solution

被引:1
作者
Hsu, DT [1 ]
Iskandar, M
Shi, FG
Lopatin, S
Shacham-Diamand, Y
Tong, HY
Zhao, B
Brongo, M
Vasudev, PK
机构
[1] Univ Calif Irvine, Dept Chem Engn & Biochem Engn & Mat Sci, Irvine, CA 92697 USA
[2] Conexant Syst, Newport Beach, CA 92660 USA
[3] Cornell Univ, Sch Elect Engn, Ithaca, NY 14853 USA
[4] Cornell Univ, Cornell Nanofabricat Facil, Ithaca, NY 14853 USA
[5] SEMATECH, Austin, TX 78741 USA
关键词
D O I
10.1149/1.1392675
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Possible interactions between nonfluorinated poly(arylether) thin films and the recently developed electroless Cu deposition solution are investigated. The results show that there is no chemical reaction between this low-dielectric-constant polymer and the electroless Cu deposition solution. However, a significant change in thickness as well as refractive index is induced by the electroless solution conditions. It is demonstrated that higher temperatures can alleviate the electroless Cu solution-induced effects as far as the glass transition temperature, the coefficient of thermal expansion, and refractive index are concerned. (C) 1999 The Electrochemical Society. S0013-4651(98)08-032-X. All rights reserved.
引用
收藏
页码:4565 / 4568
页数:4
相关论文
共 14 条
[1]   ELLIPSOMETRIC STUDY OF THE GLASS-TRANSITION AND THERMAL-EXPANSION COEFFICIENTS OF THIN POLYMER-FILMS [J].
BEAUCAGE, G ;
COMPOSTO, R ;
STEIN, RS .
JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS, 1993, 31 (03) :319-326
[2]   Selective and blanket electroless copper deposition for ultralarge scale integration [J].
Dubin, VM ;
ShachamDiamand, Y ;
Zhao, B ;
Vasudev, PK ;
Ting, CH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (03) :898-908
[3]  
Hendricks NH, 1997, MATER RES SOC SYMP P, V443, P3
[4]   BENDING-BEAM MEASUREMENT OF SOLVENT DIFFUSIONS IN POLYIMIDES - THEORETICAL AND EXPERIMENTAL [J].
JOU, JH ;
HSU, L .
JOURNAL OF APPLIED POLYMER SCIENCE, 1992, 44 (02) :191-198
[5]   Class transition temperature and thermal expansion behaviour of polymer films investigated by variable temperature spectroscopic ellipsometry [J].
Kahle, O ;
Wielsch, U ;
Metzner, H ;
Bauer, J ;
Uhlig, C ;
Zawatzki, C .
THIN SOLID FILMS, 1998, 313 :803-807
[6]   SIZE-DEPENDENT DEPRESSION OF THE GLASS-TRANSITION TEMPERATURE IN POLYMER-FILMS [J].
KEDDIE, JL ;
JONES, RAL ;
CORY, RA .
EUROPHYSICS LETTERS, 1994, 27 (01) :59-64
[7]   INTERFACE AND SURFACE EFFECTS ON THE GLASS-TRANSITION TEMPERATURE IN THIN POLYMER-FILMS [J].
KEDDIE, JL ;
JONES, RAL ;
CORY, RA .
FARADAY DISCUSSIONS, 1994, 98 :219-230
[8]  
Murarka SP, 1996, SOLID STATE TECHNOL, V39, P83
[9]   ELECTROLESS COPPER DEPOSITION FOR ULSI [J].
SHACHAMDIAMAND, Y ;
DUBIN, V ;
ANGYAL, M .
THIN SOLID FILMS, 1995, 262 (1-2) :93-103
[10]  
Singer P., 1997, Semiconductor International, V20, P67