Carbon material deposition by remote RF plasma beam

被引：18
作者：
Mitu, B
Vizireanu, S
Petcu, C
Dinescu, G
Dinescu, M
Birjega, R
Teodorescu, VS
机构：
[1] Natl Inst Lasers Plasma & Radiat Phys, Bucharest, Romania
[2] Zecasin SA, Bucharest, Romania
[3] Natl Inst Mat Phys, Bucharest, Romania
来源：
SURFACE & COATINGS TECHNOLOGY | 2004年 / 180卷
关键词：
remote plasma deposition; carbon material; hydrogenated/nitrogenated carbon films; emission spectroscopy;
D O I：
10.1016/j.surfcoat.2003.10.147
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Hydrogenated and nitrogenated carbon films were obtained by PECVD with carbon species supplied by acetylene gas injected into an argon or argon/nitrogen remote plasma generated by an expanding radiofrequency discharge. The properties of carbon material like the nature of bonds, morphology, surface topography, crystallinity are presented. The reaction pathways linking the precursors with the depositing species, as revealed by emission spectroscopy, are discussed. (C) 2003 Elsevier B.V. All rights reserved.
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收藏
页码：238 / 243
页数：6
相关论文
共 17 条
[1]   FORMATION OF CARBON NITRIDE FILMS ON SI(100) SUBSTRATES BY ELECTRON-CYCLOTRON-RESONANCE PLASMA-ASSISTED VAPOR-DEPOSITION [J].
BOUSETTA, A ;
LU, M ;
BENSAOULA, A ;
SCHULTZ, A .
APPLIED PHYSICS LETTERS, 1994, 65 (06) :696-698
[2]   Mechanical and tribological properties of CNx films deposited by reactive magnetron sputtering [J].
Broitman, E ;
Hellgren, N ;
Wänstrand, O ;
Johansson, MP ;
Berlind, T ;
Sjöström, H ;
Sundgren, JE ;
Larsson, M ;
Hultman, L .
WEAR, 2001, 248 (1-2) :55-64
[3]   Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition:: II.: Ar/N2 plasma with graphite nozzle [J].
de Graaf, A ;
Aldea, E ;
Dinescu, G ;
van de Sanden, MCM .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2001, 10 (03) :524-529
[4]   Branching ratios in dissociative recombination of the C2H2+ molecular ion [J].
Derkatch, AM ;
Al-Khalili, A ;
Vikor, L ;
Neau, A ;
Shi, W ;
Danared, H ;
af Ugglas, M ;
Larsson, M .
JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 1999, 32 (14) :3391-3398
[5]   Characterization of carbon nitride thin films deposited by a combined RF and DC plasma beam [J].
Dinescu, G ;
Aldea, E ;
Musa, G ;
van de Sanden, MCM ;
de Graaf, A ;
Ghica, C ;
Gartner, M ;
Andrei, A .
THIN SOLID FILMS, 1998, 325 (1-2) :123-129
[6]   SPECTRAL AND ELECTRICAL-PROPERTIES OF A MEDIUM PRESSURE, LOW-POWER, RF-GENERATED POSTDISCHARGE NITROGEN PLASMA-JET [J].
DINESCU, G ;
MARIS, O ;
MUSA, G .
CONTRIBUTIONS TO PLASMA PHYSICS, 1991, 31 (01) :49-61
[7]   A double-chamber capacitively coupled RF discharge for plasma assisting deposition techniques [J].
Dinescu, G ;
Mitu, B ;
Aldea, E ;
Dinescu, M .
VACUUM, 2000, 56 (01) :83-86
[8]   Investigation of diamond-like carbon films synthesized by multi-jet hollow cathode rf plasma source [J].
Fedosenko, G ;
Korzec, D ;
Engemann, J ;
Lyebyedyev, D ;
Scheer, HC .
THIN SOLID FILMS, 2002, 406 (1-2) :275-281
[9]   Optical and mechanical properties of plasma-beam-deposited amorphous hydrogenated carbon [J].
Gielen, JWAM ;
Kleuskens, PRM ;
vandeSanden, MCM ;
vanIjzendoorn, LJ ;
Schram, DC ;
Dekempeneer, EHA ;
Meneve, J .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (10) :5986-5995
[10]   Diamond-like carbon: state of the art [J].
Grill, A .
DIAMOND AND RELATED MATERIALS, 1999, 8 (2-5) :428-434
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