Growth morphology and compositional analysis of InxGa1-xSb crystals-grown by vertical directional solidification technique

被引:0
作者
Gadkari, DB [1 ]
Shashidharan, P [1 ]
Lal, KB [1 ]
Gokhale, NA [1 ]
Shah, AP [1 ]
Arora, BM [1 ]
机构
[1] Mithibai Coll, Dept Phys, Mumbai 400056, India
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中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
InxGa1-xSb (x = 0.5) single crystals of 12 mm diameter and 50-60 mm length have been grown from stoichiometric source materials by using vertical directional solidification technique. The optimized growth conditions are ampoule translation velocity 0.84 mu m/sec, rotation speed 10 rpm and ampoule with argon pressure (100 torr). The axial compositional profile has been determined by Vegard-law and showed mixing of the melt. Hall measurements reveal the conversion of n-type to p-type conduction along the growth axis and vice versa. Radial resistivity measurements by foul probe exhibited the nearly homogeneous growth. The growth morphology was attributed to the intrinsic crystallographic microstructures.
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页码:652 / 656
页数:5
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