Deposition of Ir Nanostructured Thin Films by Pulse CVD

被引：4

作者：

Gelfond, Nikolay V. ^{[1
]}

Semyannikov, Pyotr P. ^{[1
]}

Trubin, Sergei V. ^{[1
]}

Morozova, Natalia B. ^{[1
]}

Igumenov, Igor K. ^{[1
]}

机构：

[1] Russian Acad Sci, Siberian Branch, Nikolaev Inst Inorgan Chem, Novosibirsk 630090, Russia

来源：

EUROCVD 17 / CVD 17 | 2009年 / 25卷 / 08期

关键词：

D O I：

10.1149/1.3207679

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Nanostructured thin iridium films were deposited by pulse CVD. Tris(acetylacetonato)iridium(III) was used as the precursor. The thermochemical properties of this precursor were determined by mass spectrometric monitoring its vapour phase interaction with heated surfaces both in vacuum and in atmospheres of H-2 and O-2. The results obtained provided a guide for understanding which pulse CVD process conditions to use for growing thin films of iridium using hydrogen or oxygen as gas reactant. Deposited iridium film thicknesses were varied from 5 to 25 nm. Iridium films were characterized by means of SEM, AFM, HRTEM and XPS.

引用

页码：871 / 874

页数：4

共 3 条

[1] Approach to control deposition of ultra thin films from metal organic precursors: Ru deposition [J].

Igumenov, Igor K. ;

Sernyannikov, Pyotr P. ;

Trubin, Sergei V. ;

Morozova, Natalia B. ;

Gelfond, Nikolay V. ;

Mischenko, Alexander V. ;

Norman, John A. .

SURFACE & COATINGS TECHNOLOGY, 2007, 201 (22-23) :9003-9008

[2] γ-Halogenated iridium(III) acetylacetonates [J].

Isakova, VG ;

Baidina, IA ;

Morozova, NB ;

Igumenov, IK .

POLYHEDRON, 2000, 19 (09) :1097-1103

[3] Saturated vapor pressure of iridium(III) acetylacetonate [J].

Morozova, NB ;

Semyannikov, PP ;

Sysoev, SV ;

Grankin, VM ;

Igumenov, IK .

JOURNAL OF THERMAL ANALYSIS AND CALORIMETRY, 2000, 60 (02) :489-495

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