Analysis of InGaN-GaN quantum well chemistry and interfaces by transmission electron microscopy and X-ray scattering

被引:0
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作者
Smeeton, TM [1 ]
Kappers, MJ [1 ]
Barnard, JS [1 ]
Humphreys, CJ [1 ]
机构
[1] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
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中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have studied the distribution of indium in InxGa1-xN single quantum wells (SQWs) with compositions of In0.18Ga0.82N and In0.22Ga0.78N. Based on lattice parameter maps extracted from HRTEM lattice fringe images, we do not find evidence for strong nanometre-scale fluctuations in the composition of the wells (indium "clusters"). Z-contrast (high-angle annular dark field) scanning TEM (STEM) and X-ray reflectivity (XRR) results both show that the width of the interface at the top of the quantum well is slightly greater than that at the bottom, which is quite abrupt. The quantum wells exhibit bright photoluminescence so these results suggest that the conventional explanation for the high efficiency of light emission from InGaN LEDs may not apply in these structures.
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页码:787 / 792
页数:6
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