Electrical characteristics dependence on the channel fin aspect ratio of multi-fin field effect transistors

被引:6
作者
Cheng, Hui-Wen [1 ]
Li, Yiming [1 ,2 ,3 ]
机构
[1] Natl Chiao Tung Univ, Inst Commun Engn, Hsinchu 300, Taiwan
[2] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 300, Taiwan
[3] Natl Nano Device Labs, Hsinchu, Taiwan
关键词
GATE; FLUCTUATIONS; MOSFETS; METAL;
D O I
10.1088/0268-1242/24/11/115021
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work we investigate the impact of the fin number and structure on device dc and dynamic behaviors of multi-fin field effect transistor (FET) circuits. Based on the same channel volume, multi-fin FETs with different fin aspect ratio (AR equivalent to fin height/fin width) are explored using an experimentally validated three-dimensional device simulation. The multi-fin FinFET (AR = 2) has a better channel controllability than the tri-gate (AR = 1) and the quasi-planar (AR = 0.5) FETs. Besides, the 6T SRAM with triple-fin FinFETs provides the largest static noise margin because of the largest transconductance. Notably, though the FinFETs are with a large effective fin width and driving current, the larger gate capacitance may limit the intrinsic device gate delay. The transient characteristics of multi-fin inverters are further examined with different load capacitance (C-load). As C-load is increased, the impact of the device intrinsic gate capacitance on transient characteristcs is decreased and the delay time compared with that of single-fin inverters is smaller due to being dominated by the driving current of the transistor. Consequently, the multi-fin FinFET circuits exhibit a smallest delay time. The results of the study provide an insight into the dc and transient characteristics of multi-fin transistors and associated digital circuits.
引用
收藏
页数:6
相关论文
共 17 条
[1]  
[Anonymous], 2006, 2006 INT EL DEV M IE, DOI DOI 10.1109/IEDM.2006.346810
[2]   The impact of intrinsic device fluctuations on CMOS SRAM cell stability [J].
Bhavnagarwala, AJ ;
Tang, XH ;
Meindl, JD .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 2001, 36 (04) :658-665
[3]  
Colinge J. P., 1990, International Electron Devices Meeting 1990. Technical Digest (Cat. No.90CH2865-4), P595, DOI 10.1109/IEDM.1990.237128
[4]   Multiple-gate SOI MOSFETs [J].
Colinge, JP .
SOLID-STATE ELECTRONICS, 2004, 48 (06) :897-905
[5]   Device scaling limits of Si MOSFETs and their application dependencies [J].
Frank, DJ ;
Dennard, RH ;
Nowak, E ;
Solomon, PM ;
Taur, Y ;
Wong, HSP .
PROCEEDINGS OF THE IEEE, 2001, 89 (03) :259-288
[6]   Mixed-mode device simulation [J].
Grasser, T ;
Selberherr, S .
MICROELECTRONICS JOURNAL, 2000, 31 (11-12) :873-881
[7]  
Kim SM, 2005, 2005 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS, P196
[8]  
Kim SM, 2004, IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2004, TECHNICAL DIGEST, P639
[9]   A practical implementation of parallel dynamic load balancing for adaptive computing in VLSI device simulation [J].
Li, Y ;
Sze, SM ;
Chao, TS .
ENGINEERING WITH COMPUTERS, 2002, 18 (02) :124-137
[10]   Discrete-dopant-induced characteristic fluctuations in 16 nm multiple-gate silicon-on-insulator devices [J].
Li, Yiming ;
Hwang, Chih-Hong .
JOURNAL OF APPLIED PHYSICS, 2007, 102 (08)