Space-resolved plasma diagnostics in a hybrid (Cr,Al)N process

The concurrent usage of direct current magnetron sputtering (dcMS) and high power pulsed magnetron sputtering (HPPMS), the so-called dcMS/HPPMS hybrid technology, enables the combination of the advantages of both technologies. These are well known to be a higher deposition rate, compared to HPPMS processes, as well as an improved roughness, microstructure, and mechanical properties, compared to dcMS processes. However, there have not been investigations which thematically focus on the understanding of the influence of different dcMS/HPPMS plasma zones on the deposition rate and the coating properties. Hence, in the present work, a dcMS/HPPMS hybrid (Cr,Al)N process was analyzed regarding the plasma and coating properties. The measurements were carried out in an industrial scale physical vapor deposition coating unit. The plasma was analyzed space-resolved and substrate oriented to map the entire area in front and beside of the cathodes. The mean ion energy decreased from the area in front and beside of the HPPMS cathode to the dcMS cathode. An interaction between the HPPMS and dcMS plasma as well as the spatial distribution of the plasma could be identified. Furthermore, (Cr,Al)N coatings were deposited on samples with fixed positions within the coating unit. The deposition rate exhibited a variation D = 0.2-13 mu m/h. The morphology changed from a dense to a partially bending columnar microstructure, depending on the zones of high and low energetic plasma and the line of sight. Published by the AVS.