Electrical properties of (Zr,Ti)0.85(Ca,Sr)0.15O1.85 thin film grown on Pt/Ti/SiO2/Si substrate using RF magnetron sputtering

被引:2
作者
Kim, Jin-Seong [1 ]
Han, Jae-Min [1 ]
Joung, Mi-Ri [1 ]
Kweon, Sang-Hyo [1 ]
Kang, Chong-Yun [2 ,3 ]
Nahm, Sahn [1 ,2 ]
机构
[1] Korea Univ, Dept Mat Sci & Engn, Seoul 136701, South Korea
[2] KU KIST Grad Sch Converging Sci & Technol, Seoul 136713, South Korea
[3] Korea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
关键词
Dielectric; Thin film; Embedded capacitor; DECOUPLING CAPACITORS; EMBEDDED CAPACITORS; MIM CAPACITORS; TEMPERATURE; RESISTORS; BEHAVIOR; LEAKAGE;
D O I
10.1016/j.ceramint.2014.06.093
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Crystalline (Zr,Ti)(0.85)(Ca,Sr)(0.15)O-1.85 (ZTCS) films were grown on a Pt/Ti/SiO2/Si substrate at various temperatures by using rf-magnetron sputtering. The ZTCS films had a cubic stabilized zirconia structure. The dielectric constant (k) of the ZTCS film grown at 300 degrees C was approximately 30.5 with a low tan delta value of 0.007 at 100 kHz. Further, this film exhibited a similar k value of 30.4 and a high quality factor of 225 at 1.0 GHz. Moreover, it showed a high capacitance density of 290 nF/cm(2) with a small TCC of -60.7 ppm/degrees C at 100 kHz. A low leakage current (1.4 x 10(-8) A/cm(2) at 1.5 MV/cm) with a high breakdown electric field (1.85 MV/cm) was also observed in this film; the leakage current of this film was explained by Schottky emission. Therefore, it can be concluded that ZTCS films grown at low temperatures ( <= 300 degrees C) are good candidates for use as embedded capacitor in printed circuit boards. (c) 2014 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
引用
收藏
页码:14957 / 14964
页数:8
相关论文
共 23 条
[1]   Embedded Capacitors in Printed Wiring Board: A Technological Review [J].
Alam, Mohammed A. ;
Azarian, Michael H. ;
Pecht, Michael G. .
JOURNAL OF ELECTRONIC MATERIALS, 2012, 41 (08) :2286-2303
[2]   Effectiveness of embedded capacitors in reducing the number of surface mount capacitors for decoupling applications [J].
Alam, Mohammed A. ;
Azarian, Michael H. ;
Osterman, Michael ;
Pecht, Michael .
CIRCUIT WORLD, 2010, 36 (01) :22-30
[3]   Next generation integral passives: materials, processes, and integration of resistors and capacitors on PWB substrates [J].
Bhattacharya, SK ;
Tummala, RR .
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2000, 11 (03) :253-268
[4]   Improved high-temperature leakage in high-density MIM capacitors by using a TiLaO dielectric and an Ir electrode [J].
Cheng, C. H. ;
Pan, H. C. ;
Yang, H. J. ;
Hsiao, C. N. ;
Chou, C. P. ;
McAlister, S. P. ;
Chin, Albert .
IEEE ELECTRON DEVICE LETTERS, 2007, 28 (12) :1095-1097
[5]   The correlation between τε and the tolerance factor in (Sr, Ca)(Ti, Zr)O3 microwave dielectric ceramics [J].
Cheon, CI ;
Kim, JS ;
Lee, HG .
JOURNAL OF MATERIALS RESEARCH, 1998, 13 (05) :1107-1109
[6]   High-performance SrTiO3 MIM capacitors for analog applications [J].
Chiang, K. C. ;
Huang, Ching-Chien ;
Chen, G. L. ;
Chen, Wen Jauh ;
Kao, H. L. ;
Wu, Yung-Hsien ;
Chin, Albert ;
McAlister, Sean P. .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2006, 53 (09) :2312-2319
[7]   AC ELECTRICAL BEHAVIOR OF POLYCRYSTALLINE ZRO2-CAO [J].
CHU, SH ;
SEITZ, MA .
JOURNAL OF SOLID STATE CHEMISTRY, 1978, 23 (3-4) :297-314
[8]   ELECTRICAL PROPERTIES OF SOLID OXIDE ELECTROLYTES [J].
ETSELL, TH ;
FLENGAS, SN .
CHEMICAL REVIEWS, 1970, 70 (03) :339-&
[9]   Preparation of thin film of CaZrO3 by pulsed laser deposition [J].
Joseph, M ;
Sivakumar, N ;
Manoravi, P ;
Vanavaramban, S .
SOLID STATE IONICS, 2001, 144 (3-4) :339-346
[10]  
Kim J.S., J AM CERAM SOC UNPUB