Electrostatic modulation of the superfluid density in an ultrathin La2-xSrxCuO4 film

被引：27

作者：

Rufenacht, A. ^{[1
]}

Locquet, J. -P.

Fompeyrine, J.

Caimi, D.

Martinoli, P.

机构：

[1] Univ Neuchatel, Inst Phys, CH-2000 Neuchatel, Switzerland

[2] IBM Corp, Div Res, Zurich Res Lab, CH-8803 Ruschlikon, Switzerland

来源：

PHYSICAL REVIEW LETTERS | 2006年 / 96卷 / 22期

关键词：

D O I：

10.1103/PhysRevLett.96.227002

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

By capacitively charging an underdoped ultrathin La2-xSrxCuO4 film with an electric field applied across a gate insulator with a high dielectric constant, relative changes of the areal superfluid density n(s square) of unprecedented strength were observed in measurements of the film kinetic inductance. Although n(s square) appears to be substantially reduced by disorder, the data provide, for the first time on the same sample, direct compelling evidence for the Uemura relation T-c proportional to n(s square)(T=0) in the underdoped regime of copper-oxide superconductors.

引用

页数：4

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