High repetition rate MPC generator-driven capillary Z-pinch EUV source

被引：2

作者：

Teramoto, Y

Sato, H

Bessho, K

Shirai, T

Yamatani, D

Takemura, T

Yokota, T

Paul, KC

Kabuki, K

Miyauchi, K

Ikeuchi, M

Okubo, K

Hotta, K

Yoshioka, M

Toyoda, K

机构：

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES VIII | 2004年 / 5374卷

关键词：

DPP; EUV source; lithography; capillary; Z-pinch; pulsed power;

D O I：

10.1117/12.536036

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Discharge-produced plasma (DPP) based EUV source have been studied and developed at EUVA/Gotenba Branch. Among the several kinds of discharge scheme, a capillary Z-pinch has been employed in our source. An all-solid-state magnetic pulse compression (MPC) generator was used to create a Z-pinch plasma. Low inductance MPC generator provides a pulsed current with about 17 kA of peak amplitude and 350 ns of pulse duration, and allows 2-kHz continuous operation. A water-cooled discharge head was coupled with the MPC generator. In order to evaluate the source performance, electrical energy input to the discharge, EUV radiation power, radiation spatial profile, pinhole image and spectra were observed. 54.4 W/2pisr/2%BW of 13.5-nm EUV output was achieved at 2-kHz operation. Through the radiation profile measurement and pinhole-camera observation, spatial image of EUV radiation was understood.

引用

页码：935 / 942

页数：8

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