Graphitic Carbon Nitride-Based Photocatalytic Materials: Preparation Strategy and Application

Among various kinds of photocatalytic semiconductors, graphitic carbon nitride (g-C3N4)-based photocatalysts have become the most attractive "celebrity" because of their stable chemical properties, appropriate band structure, and facile synthesis. Here, we provide a systematic review of g-C3N4-based photocatalytic materials based on the latest related research progress. The design ideas and preparation methods of g-C3N4-based photocatalysts are summarized, including morphology control of a three-dimensional structure, active site engineering, defect/vacancy engineering, and interface engineering. In addition, the typical applications of g-C3N4-based photocatalysts are also discussed in detail, involving water splitting (overall water splitting, H-2 evolution, O-2 evolution), organic transformation reactions (oxidation reaction, reduction reaction, coupling reaction), and degradation of organic pollutants. This perspective ends with a summary and perspectives on facing the challenges and directions of future development in this research field.