Crystallographic orientation dependence of radiation damage in Ga-ion irradiated Ni-based alloy processed by a focused ion beam

被引：7

作者：

Zhu, Hanliang ^{[1
]}

Davis, Joel ^{[1
]}

Li, Zhijun ^{[2
]}

机构：

[1] Australian Nucl Sci & Technol Org, Locked Bag 2001, Sydney, NSW 2232, Australia

[2] Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2019年 / 455卷

关键词：

Ni alloy; Grain orientation; Atom arrangement; Irradiation; Defects; Sputter yield; CORROSION; HELIUM; YIELDS;

D O I：

10.1016/j.nimb.2019.06.026

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The effect of crystallographic orientation on radiation damage in Ga-ion irradiated Ni-based polycrystalline alloy processed by a focused ion beam was investigated using advanced analytical transmission electron microscopy. After irradiation, the radiation-induced defects exhibited different morphologies on the surfaces of {0 0 1}, {0 1 2} and {1 1 4} grains of the Ni-based alloy. Moreover, the {0 0 1} grain was found to have thicker remaining material than the {0 1 2} and {1 1 4} grains, indicating that the {0 0 1} grain had a larger sputter yield than the other two grains during irradiation. The physical nature of the crystallographic orientation dependence of the defect morphology and sputter yield was investigated and discussed.

引用

页码：83 / 89

页数：7

共 21 条

[1]

[Anonymous], GEN US CRYSTALMAKER

[2] Effect of Crystallographic Orientation on the Corrosion of Magnesium: Comparison of Film Forming and Bare Crystal Facets using Electrochemical Impedance and Raman Spectroscopy [J].

Bland, Leslie G. ;

Gusieva, K. ;

Scully, J. R. .

ELECTROCHIMICA ACTA, 2017, 227 :136-151

[3] Difference in anisotropic etching characteristics of alkaline and copper based acid solutions for single-crystalline Si [J].

Chen, Wei ;

Liu, Yaoping ;

Yang, Lixia ;

Wu, Juntao ;

Chen, Quansheng ;

Zhao, Yan ;

Wang, Yan ;

Du, Xiaolong .

SCIENTIFIC REPORTS, 2018, 8

[4] A review of focused ion beam milling techniques for TEM specimen preparation [J].

Giannuzzi, LA ;

Stevie, FA .

MICRON, 1999, 30 (03) :197-204

[5]

Guseva M. I., 1986, PHYS RAD EFFECTS CRY, V13, P621

[6] INFLUENCE OF TARGET STRUCTURE ON BLISTER FORMATION BY HELIUM AND HYDROGEN-IONS BOMBARDMENT [J].

GUSEVA, MI ;

IONOVA, ES ;

ZYKOVA, NM ;

KOLTYGIN, VM ;

KRASULIN, YL ;

KURAKINA, TS ;

NEDOSPASOV, AV ;

ROSINA, IA .

JOURNAL OF NUCLEAR MATERIALS, 1978, 76-7 (1-2) :224-227

[7] Preferential Grain Etching of AlMgSi(Zn) Model Alloys [J].

Holme, B. ;

Ljones, N. ;

Bakken, A. ;

Lunder, O. ;

Lein, J. E. ;

Vines, L. ;

Hauge, T. ;

Bauger, O. ;

Nisancioglu, K. .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2010, 157 (12) :C424-C427

[8] Determining the sputter yields of molybdenum in low-index crystal planes via electron backscattered diffraction, focused ion beam and atomic force microscope [J].

Huang, H. S. ;

Chiu, C. H. ;

Hong, I. T. ;

Tung, H. C. ;

Chien, F. S. -S. .

MATERIALS CHARACTERIZATION, 2013, 83 :68-73

[9]

Koch C T., 2002, Determination of core structure periodicity and point defect density along dislocation

[10] SPUTTERING YIELDS OF SINGLE CRYSTALS BOMBARDED BY 1- TO 10-KEV AR+ IONS [J].

MAGNUSON, GD ;

CARLSTON, CE .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (11) :3267-&

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