X-ray residual stress measurement in titanium nitride thin films

被引:0
作者
Dopita, M
Rafaja, D
机构
[1] Charles Univ, Fac Math & Phys, Prague 12116 2, Czech Republic
[2] TU Bergakad, Inst Phys Met, D-09599 Freiberg, Germany
来源
ZEITSCHRIFT FUR KRISTALLOGRAPHIE | 2006年
关键词
X-ray diffraction; thin films; residual stress;
D O I
暂无
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
This contribution compares and discusses three different approaches commonly used for determination of the residual stresses from X-ray diffraction data - the sin(2)psi,f(psi) and the Direct Solution method. For the calculation of the X-ray elastic constants (XECs), three grain interaction models were compared - Reuss, Voigt and Neerfeld-Hill. The best reliability of the results was achieved using the f(psi) method because of its highest statistical relevance. The elastic grain interaction of the thin films was most accurately described by the Reuss model.
引用
收藏
页码:67 / 72
页数:6
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