Crystallized TiO2 film growth on unheated substrates by pulse-powered magnetron sputtering

被引：5

作者：

Kamei, Masayuki ^{[1
]}

Ishigaki, Takamasa ^{[1
]}

机构：

[1] Natl Inst Mat Sci, Adv Mat Lab, Tsukuba, Ibaraki 3050044, Japan

来源：

THIN SOLID FILMS | 2006年 / 515卷 / 02期

关键词：

TiO2; photocatalytic properties; low temperature crystallization; sputtering; OPTICAL-EMISSION SPECTROSCOPY; TITANIUM-DIOXIDE; SURFACES; TEMPERATURE; PLASMAS; MODE;

D O I：

10.1016/j.tsf.2005.12.224

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Crystallized TiO2 films were successfully grown in situ without heating by bipolar-pulse sputtering method at high deposition rates (similar to 40 nm/min). The optical emission study of the sputtering plasma during growth revealed that the "pulse geometry" had a great influence on the electron/ ion temperature of the plasma. It was revealed that the crystallization and the accompanying enhancement in the photocatalytic activity were not caused by the "temperature effect" but caused by the "plasma effect". (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：627 / 630

页数：4

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