X-ray stress measurements of TiCN thin films

TiCN thin films deposited by Physical Vapor Deposition (PVD) were heated to various temperatures. Using X-ray diffraction technique, the preferred orientation of the crystallites was evaluated from pole figures and the crystallite Orientation Distribution Function (ODF) was calculated from the pole figures. After that, the residual stress was analyzed using the X-ray elastic constant obtained from the ODR As a result of the heat treatment, the residual compressive stress relaxed at temperatures higher than 573K.