Magnetic phase transition and spin-reorientation transition of Cu/Ni/Fe/Cu(001) studied by photoemission electron microscopy

被引：10

作者：

Zhao, HW ^{[1
]}

Won, C

Wu, YZ

Scholl, A

Doran, A

Qiu, ZQ

机构：

[1] Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA

[2] Chinese Acad Sci, Int Ctr Quantum Struct, Beijing 100080, Peoples R China

[3] Chinese Acad Sci, Inst Phys, State Key Lab Magnetism, Beijing 100080, Peoples R China

[4] Univ Calif Berkeley, Lawrence Berkeley Lab, Adv Light Source, Berkeley, CA 94720 USA

[5] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USA

来源：

PHYSICAL REVIEW B | 2004年 / 70卷 / 02期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1103/PhysRevB.70.024423

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Magnetic phase transition and spin-reorientation transition in a Cu/Ni/Fe/Cu(001) system are investigated at room temperature using photoemission electron microscopy. For fixed Fe film thickness, the Cu/Ni/Fe/Cu(100) film exhibits two transitions with increasing Ni thickness: one transition corresponds to a paramagnetic to ferromagnetic transition, and the other transition corresponds to a spin-reorientation transition. A phase diagram is constructed in the Ni-Fe thickness plane to describe these two transitions. For each transition, we find that the Ni transition thickness changes monotonically as the Fe film thickness increases from 0 to 4 ML, and then remains a constant value for Fe thickness in the range of 5-11 ML. These results are attributed to the ferromagnetic and antiferromagnetic phases of the fcc Fe film and to the in-plane Ni/Fe interfacial magnetic anisotropy.

引用

页码：024423 / 1

页数：6

共 30 条

[1] MAGNETIZATION DIRECTION SWITCHING IN FE/CU(100) EPITAXIAL-FILMS - TEMPERATURE AND THICKNESS DEPENDENCE [J].