The elliptical polarization dependence of the two-photon absorption coefficient beta in InP has been measured by the extended Z-scan technique for thick materials in the wavelength range from 1640 to 1800 nm. The analytical formula of the Z-scan technique has been extended with consideration of multiple reflections. The Z-scan results have been fitted very well by the formula and beta has been evaluated accurately. The three independent elements of the third-order nonlinear susceptibility tensor in InP have also been determined accurately from the elliptical polarization dependence of beta. (C) 2018 The Japan Society of Applied Physics
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USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
Gen Dynam Informat Technol, Dayton, OH 45431 USAUSAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
Gonzalez, Leonel P.
;
Murray, Joel M.
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USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
Gen Dynam Informat Technol, Dayton, OH 45431 USAUSAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
Murray, Joel M.
;
Krishnamurthy, Srinivasan
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SRI Int, Menlo Pk, CA 94025 USAUSAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
Krishnamurthy, Srinivasan
;
Guha, Shekhar
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USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USAUSAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
机构:
USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
Gen Dynam Informat Technol, Dayton, OH 45431 USAUSAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
Gonzalez, Leonel P.
;
Murray, Joel M.
论文数: 0引用数: 0
h-index: 0
机构:
USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
Gen Dynam Informat Technol, Dayton, OH 45431 USAUSAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
Murray, Joel M.
;
Krishnamurthy, Srinivasan
论文数: 0引用数: 0
h-index: 0
机构:
SRI Int, Menlo Pk, CA 94025 USAUSAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
Krishnamurthy, Srinivasan
;
Guha, Shekhar
论文数: 0引用数: 0
h-index: 0
机构:
USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USAUSAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA