Optimum operating frequency of an atmospheric-pressure dielectric-barrier discharge for the photo-resistor ashing process

被引:0
作者
Kim, Gon-Ho [1 ]
Song, Sang-Heon
机构
[1] Seoul Natl Univ, Plasma Applicat Lab, Dept Nucl Engn, Seoul 151744, South Korea
[2] Samsung Elect, AMLCD Div, Gyeonggi 449711, South Korea
关键词
atmospheric pressure; dielectric barrier discharge; PR ashing;
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
In an atmospheric-pressure dielectric barrier-discharge (AP-DBD) source, we considered the operating condition to achieve the maximum power dissipation and photoresistor (PR) ashing rate. The AP-DBD generated in a two plate electrodes cell was employed to observe the nature of discharge. Since the discharge can be sustained for a long period with a higher reactor capacitance, the dissipated power and PR ashing rate could be maximized at a specific operating frequency by varying the reactor capacitance. Therefore, the operating frequency and the reactor capacitance play an important role in the optimization of the reactor operation and the PR ashing process. The reactor capacitance was determined from the reactor configuration, the electrode size, the gap between the electrodes, and the dielectric properties of the insulator on the electrode. The result will be applicable to the development of a large-scale process reactor using AP-DBD.
引用
收藏
页码:558 / 562
页数:5
相关论文
共 9 条
  • [1] MODELING AND APPLICATIONS OF SILENT DISCHARGE PLASMAS
    ELIASSON, B
    KOGELSCHATZ, U
    [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 1991, 19 (02) : 309 - 323
  • [2] Microdischarge behaviour in the silent discharge of nitrogen-oxygen and water-air mixtures
    Falkenstein, Z
    Coogan, JJ
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1997, 30 (05) : 817 - 825
  • [3] Photoresist etching with dielectric barrier discharges in oxygen
    Falkenstein, Z
    Coogan, JJ
    [J]. JOURNAL OF APPLIED PHYSICS, 1997, 82 (12) : 6273 - 6280
  • [4] Application of atmospheric pressure dielectric barrier discharges in deposition, cleaning and activation
    Goossens, O
    Dekempeneer, E
    Vangeneugden, D
    Van de Leest, R
    Leys, C
    [J]. SURFACE & COATINGS TECHNOLOGY, 2001, 142 : 474 - 481
  • [5] Etching materials with an atmospheric-pressure plasma jet
    Jeong, JY
    Babayan, SE
    Tu, VJ
    Park, J
    Henins, I
    Hicks, RF
    Selwyn, GS
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (03) : 282 - 285
  • [6] KIM GH, 2006, IN PRESS J KOREA SEP
  • [7] Generation of large-volume, atmospheric-pressure, nonequilibrium plasmas
    Kunhardt, EE
    [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 2000, 28 (01) : 189 - 200
  • [8] Manley T.C., 1943, Transactions of the Electrochemical Society, V84, DOI DOI 10.1149/1.3071556
  • [9] Characteristic of a dielectric barrier discharges using capillary dielectric and its application to photoresist etching
    Yi, CH
    Lee, YH
    Kim, DW
    Yeom, GY
    [J]. SURFACE & COATINGS TECHNOLOGY, 2003, 163 : 723 - 727