Application of secondary neutral mass spectrometry in low-energy sputtering yield measurements

被引:12
作者
Bhattacharjee, S
Zhang, J
Shutthanandan, V
Ray, PK
Shivaparan, NR
Smith, RJ
机构
[1] TUSKEGEE UNIV,DEPT MECH ENGN,TUSKEGEE,AL 36088
[2] MONTANA STATE UNIV,DEPT PHYS,BOZEMAN,MT 59717
基金
美国国家航空航天局;
关键词
D O I
10.1016/S0168-583X(97)00145-6
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
An experimental study was initiated to measure low-energy (150 to 600 eV) sputtering yields of molybdenum with xenon ions using a Secondary Neutral Mass Spectrometer (SNMS). An ion gun was used to generate the ion beam. The ion current density at the target surface was approximately 30 mu A/cm(2). The SNMS spectra obtained at 50 degrees incident angle were converted to sputtering yields for perpendicular incidence by normalizing SNMS spectral data at 500 eV with the yield measured by Rutherford backscattering spectrometry. Sputtering yields as well as the shape of the yield-energy curve obtained in this manner are in reasonable agreement with those measured by other researchers using different techniques. Sputtering yields calculated by using two semi-empirical formulations agree reasonably well with the measured data.
引用
收藏
页码:123 / 129
页数:7
相关论文
共 21 条
[1]  
ANDERSEN HH, 1981, SUPTTERING PARTICLE, V1, P193
[2]  
Ashley S, 1995, MECH ENG, V117, P61
[3]  
BEATTIE JR, 1989, 174974 NASACR
[4]  
Bodhansky J., 1984, NUCL INSTRUM METH B, V2, P587
[5]  
CARVEY L, 1990, AIAA902621
[6]   SPUTTERING OF COBALT AND CHROMIUM BY ARGON AND XENON IONS NEAR THE THRESHOLD ENERGY REGION [J].
HANDOO, AK ;
RAY, PK .
CANADIAN JOURNAL OF PHYSICS, 1993, 71 (3-4) :155-158
[7]   SPUTTERING YIELD OF CHROMIUM BY ARGON AND XENON IONS WITH ENERGIES FROM 50 TO 500-E V [J].
HANDOO, AK ;
RAY, PK .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1992, 54 (01) :92-94
[8]  
KITTEL C, 1976, INTRO SOLID STATE PH, P74
[9]  
LINDHARD J, 1968, KGL DANSKE VIDENSKAB, V36, P10
[10]  
Lindhard J., 1963, MAT FYS MEDD DAN VID, V33, P14