Improvement in electrical performance of half-metallic Fe3O4/GaAs structures using pyrolyzed polymer film as buffer layer

被引:7
作者
Akin, Seckin [1 ]
Ozel, Faruk [2 ,3 ]
Kus, Mahmut [2 ,3 ]
Sonmezoglu, Savas [1 ]
机构
[1] Karamanoglu Mehmetbey Univ, Dept Mat Sci & Engn, Fac Engn, TR-70200 Karaman, Turkey
[2] Selcuk Univ, Dept Chem Engn, Fac Engn, TR-42075 Konya, Turkey
[3] Selcuk Univ, Adv Technol Res & Applicat Ctr, TR-42075 Konya, Turkey
关键词
half-metallic/insulator/semiconductor (h-MIS) structures; Fe3O4; nanoparticles; pyrolyzed polymer film; I-V measurements; CURRENT-TRANSPORT MECHANISM; INTERFACE STATE DENSITY; SCHOTTKY-BARRIER; MAGNETIC-PROPERTIES; TEMPERATURE-DEPENDENCE; OHMIC CONTACTS; IV PLOT; DIODES; NANOPARTICLES; GAAS;
D O I
10.1080/14786435.2014.927599
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work, the Fe3O4 magnetic nanoparticles (MNPs) were synthesized by a colloidal method. TEM images reveal that Fe3O4 MNPs are spherical in shape with a narrow size distribution in the range of 6-7 nm. These MNPs were used in the fabrication of two types of n-GaAs-based structures: (i) Fe3O4/n-GaAs (reference); and (ii) Fe3O4/PPF/n-GaAs. We present that carbon-based pyrolyzed polymer films (PPFs), as a buffer layer, can control the electrical characteristics of a conventional Fe3O4/n-GaAs device. The behaviour of the apparent barrier height and ideality factor with the interfacial layer due to the presence of the interface state density is discussed. PPF raises the barrier height in a Fe3O4/PPF/n-GaAs half-metallic/insulator/semiconductor (h-MIS) device as high as 0.62 +/- 0.002 eV. Furthermore, Fe3O4/PPF interfaces exhibit unique electronic properties including high-quality interface, low series resistance (from 17.73 k Omega to 85.66 Omega) and extremely low interface state density (1.76 x 10(12) eV(-1) cm(-2)). Compared to the electrical performance for the Fe3O4/n-GaAs junction, that for the Fe3O4/PPF/n-GaAs junction was enhanced.
引用
收藏
页码:2678 / 2691
页数:14
相关论文
共 46 条
[1]  
Bakshi U.A., 2008, SEMICONDUCTOR DEVICE
[2]  
Bruck S.D., 1965, POLYMER, V6, P319, DOI 10.1016/0032-3861(65)90082-0
[3]   STUDIES OF TUNNEL MOS DIODES .1. INTERFACE EFFECTS IN SILICON SCHOTTKY DIODES [J].
CARD, HC ;
RHODERICK, EH .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1971, 4 (10) :1589-+
[4]   EXTRACTION OF SCHOTTKY DIODE PARAMETERS FROM FORWARD CURRENT-VOLTAGE CHARACTERISTICS [J].
CHEUNG, SK ;
CHEUNG, NW .
APPLIED PHYSICS LETTERS, 1986, 49 (02) :85-87
[5]   FORWARD IV PLOT FOR NONIDEAL SCHOTTKY DIODES WITH HIGH SERIES RESISTANCE [J].
CIBILS, RM ;
BUITRAGO, RH .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (02) :1075-1077
[6]   TEMPERATURE-DEPENDENCE OF IV AND C-V CHARACTERISTICS OF NI/N-CDF2 SCHOTTKY-BARRIER TYPE DIODES [J].
COVA, P ;
SINGH, A .
SOLID-STATE ELECTRONICS, 1990, 33 (01) :11-19
[7]   SURFACE STATES AND BARRIER HEIGHT OF METAL-SEMICONDUCTOR SYSTEMS [J].
COWLEY, AM ;
SZE, SM .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (10) :3212-&
[8]  
Cullity B. D., 1978, ELEMENTS XRAY DIFFRA
[9]   Evidence for the half-metallic ferromagnetic state of Fe3O4 by spin-resolved photoelectron spectroscopy -: art. no. 064417 [J].
Dedkov, YS ;
Rüdiger, U ;
Güntherodt, G .
PHYSICAL REVIEW B, 2002, 65 (06) :1-5
[10]   Electrical transport properties and room-temperature positive magnetoresistance of Fe3O4/a-C/n-Si junctions [J].
Fan, Z. W. ;
Li, P. ;
Zhang, L. T. ;
Mi, W. B. ;
Jiang, E. Y. ;
Bai, H. L. .
THIN SOLID FILMS, 2012, 520 (09) :3641-3646