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Low debris laser plasma source
被引：0
作者：
Chen, B
Lin, JQ
Zhang, X
Cao, JL
机构：
来源：
APPLICATIONS OF X RAYS GENERATED FROM LASERS AND OTHER BRIGHT SOURCES
|
1997年
/
3157卷
关键词：
laser plasma source;
cryogenic target;
low debris;
lithography;
microscopy;
D O I：
10.1117/12.290264
中图分类号：
O43 [光学];
学科分类号：
070207 ;
0803 ;
摘要：
In this paper we describe a low debris laser plasma source with cryogenic CO2 target developed in our institute, which can emit strong line radiation in EUV region even in water window. In particular the source is a very important candidate radiation source for the future EUV lithography production line.
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页码：302 / 305
页数：4
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