Galvanostatic Ion Detrapping Rejuvenates Oxide Thin Films

被引:77
作者
Arvizu, Miguel A. [1 ]
Wen, Rui-Tao [1 ]
Primetzhofer, Daniel
Klemberg-Sapieha, Jolanta E. [2 ,3 ]
Martinu, Ludvik [2 ,3 ]
Niklasson, Gunnar A. [1 ]
Granqvist, Claes G. [1 ]
机构
[1] Uppsala Univ, Dept Engn Sci, Angstrom Lab, SE-75120 Uppsala, Sweden
[2] Uppsala Univ, Ion Phys, Dept Phys & Astron, SE-75120 Uppsala, Sweden
[3] Ecole Polytech, Dept Engn Phys, Montreal, PQ H3C 3A7, Canada
基金
欧洲研究理事会;
关键词
smart windows; WO3; electrochromism; ion detrapping; ToF-ERDA; NICKEL-OXIDE; ELECTROCHROMISM; INTERCALATION; DURABILITY; CHALLENGES; KINETICS; WINDOWS; WO3;
D O I
10.1021/acsami.5b09430
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Ion trapping under charge insertion-extraction is well-known to degrade the electrochemical performance of oxides. Galvano-static treatment was recently shown capable to rejuvenate the oxide, but the detailed mechanism remained uncertain. Here we report on amorphous electrochromic (EC) WO3 thin films prepared by sputtering and electrochemically cycled in a lithium-containing electrolyte under conditions leading to severe loss of charge exchange capacity and optical modulation span. Time-of-flight elastic recoil detection analysis (ToF-ERDA) documented pronounced Li+ trapping associated with the degradation of the EC properties and, importantly, that Li+ detrapping, caused by a weak constant current drawn through the film for some time, could recover the original EC performance. Thus, ToF-ERDA provided direct and unambiguous evidence for Li+ detrapping.
引用
收藏
页码:26387 / 26390
页数:4
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