Optical Measurement of Water Vapor Concentration and Gas Pressure

被引：8

作者：

Wang, Qiang ^{[1
,2
]}

Chang, Jun ^{[1
,2
]}

Kong, De Long ^{[3
]}

Liu, Yong Ning ^{[1
,2
]}

Wang, Fu Peng ^{[1
,2
]}

Zhu, Cun Guang ^{[1
,2
]}

Wei, Wei ^{[1
,2
]}

Liu, Xiang Zhi ^{[4
]}

机构：

[1] Shandong Univ, Sch Informat Sci & Engn, Jinan 250100, Peoples R China

[2] Shandong Univ, Shandong Prov Key Lab Laser Technol & Applicat, Jinan 250100, Peoples R China

[3] Lanso Konly Instruments Co Ltd, Shanghai 201108, Peoples R China

[4] Shandong Acad Sci, Inst Automat, Jinan 250014, Peoples R China

来源：

IEEE SENSORS JOURNAL | 2014年 / 14卷 / 02期

关键词：

FWHM; high pressure; Levenberg-Marquardt algorithm; water vapor measurement; SPECTROSCOPY; SPECTRA; LASER; NM;

D O I：

10.1109/JSEN.2013.2284279

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A technique is proposed to realize simultaneous measurement of water vapor concentration and total gas pressure. The technique is based on distributed feedback laser diode wavelength scanning, and it is in conjunction with Levenberg-Marquardt algorithm (LMA). Water vapor concentration at a pressure of 5.7 atm has been measured with a differential value between the peak value and the base line, which is derived from the fitting absorption spectrum after LMA processing; and measuring accuracy <20 ppm has been achieved. Simultaneously, gas pressure inside the gas cell can be obtained by calculating full width at half maximum after application of this fitting algorithm, and an accuracy better than 5% has been achieved in a range of 1.02-7.48 atm.

引用

页码：563 / 569

页数：7

共 17 条

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