Optical Measurement of Water Vapor Concentration and Gas Pressure

被引:8
作者
Wang, Qiang [1 ,2 ]
Chang, Jun [1 ,2 ]
Kong, De Long [3 ]
Liu, Yong Ning [1 ,2 ]
Wang, Fu Peng [1 ,2 ]
Zhu, Cun Guang [1 ,2 ]
Wei, Wei [1 ,2 ]
Liu, Xiang Zhi [4 ]
机构
[1] Shandong Univ, Sch Informat Sci & Engn, Jinan 250100, Peoples R China
[2] Shandong Univ, Shandong Prov Key Lab Laser Technol & Applicat, Jinan 250100, Peoples R China
[3] Lanso Konly Instruments Co Ltd, Shanghai 201108, Peoples R China
[4] Shandong Acad Sci, Inst Automat, Jinan 250014, Peoples R China
关键词
FWHM; high pressure; Levenberg-Marquardt algorithm; water vapor measurement; SPECTROSCOPY; SPECTRA; LASER; NM;
D O I
10.1109/JSEN.2013.2284279
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A technique is proposed to realize simultaneous measurement of water vapor concentration and total gas pressure. The technique is based on distributed feedback laser diode wavelength scanning, and it is in conjunction with Levenberg-Marquardt algorithm (LMA). Water vapor concentration at a pressure of 5.7 atm has been measured with a differential value between the peak value and the base line, which is derived from the fitting absorption spectrum after LMA processing; and measuring accuracy <20 ppm has been achieved. Simultaneously, gas pressure inside the gas cell can be obtained by calculating full width at half maximum after application of this fitting algorithm, and an accuracy better than 5% has been achieved in a range of 1.02-7.48 atm.
引用
收藏
页码:563 / 569
页数:7
相关论文
共 17 条
[1]   In situ optical diagnostics for measurements of water vapor partial pressure in a PEM fuel cell [J].
Basu, Saptarshi ;
Xu, Hang ;
Renfro, Michael W. ;
Cetegen, Baki M. .
JOURNAL OF FUEL CELL SCIENCE AND TECHNOLOGY, 2006, 3 (01) :1-7
[2]  
GOLDMEER J, 2000, P LASER APPL CHEM EN, V36, P1
[3]  
Hobbs P. C. D., 1990, P SOC PHOTOOPT INSTR, V1376, P216
[4]   Absolute, high resolution water transpiration rate measurements on single plant leaves via tunable diode laser absorption spectroscopy (TDLAS) at 1.37 μm [J].
Hunsmann, S. ;
Wunderle, K. ;
Wagner, S. ;
Rascher, U. ;
Schurr, U. ;
Ebert, V. .
APPLIED PHYSICS B-LASERS AND OPTICS, 2008, 92 (03) :393-401
[5]   Measurements of spectral parameters of water-vapour transitions near 1388 and 1345 nm for accurate simulation of high-pressure absorption spectra [J].
Liu, Xiang ;
Jeffries, Jay B. ;
Hanson, Ronald K. .
MEASUREMENT SCIENCE AND TECHNOLOGY, 2007, 18 (05) :1185-1194
[6]  
Lourakis M. I. A., 2005, FORTH ICS BRIEF DESC
[7]  
Marquardt D., 1963, SIAM J APPL MATH, V11, P431, DOI [DOI 10.1137/0111030, 10.1137/0111030]
[8]   Calculation of gas spectra for quantitative Fourier transform infrared spectroscopy of chemical vapor deposition [J].
Morrison, PW ;
Taweechokesupsin, O .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (09) :3212-3219
[9]   The HITRAN 2008 molecular spectroscopic database [J].
Rothman, L. S. ;
Gordon, I. E. ;
Barbe, A. ;
Benner, D. Chris ;
Bernath, P. E. ;
Birk, M. ;
Boudon, V. ;
Brown, L. R. ;
Campargue, A. ;
Champion, J. -P. ;
Chance, K. ;
Coudert, L. H. ;
Dana, V. ;
Devi, V. M. ;
Fally, S. ;
Flaud, J. -M. ;
Gamache, R. R. ;
Goldman, A. ;
Jacquemart, D. ;
Kleiner, I. ;
Lacome, N. ;
Lafferty, W. J. ;
Mandin, J. -Y. ;
Massie, S. T. ;
Mikhailenko, S. N. ;
Miller, C. E. ;
Moazzen-Ahmadi, N. ;
Naumenko, O. V. ;
Nikitin, A. V. ;
Orphal, J. ;
Perevalov, V. I. ;
Perrin, A. ;
Predoi-Cross, A. ;
Rinsland, C. P. ;
Rotger, M. ;
Simeckova, M. ;
Smith, M. A. H. ;
Sung, K. ;
Tashkun, S. A. ;
Tennyson, J. ;
Toth, R. A. ;
Vandaele, A. C. ;
Vander Auwera, J. .
JOURNAL OF QUANTITATIVE SPECTROSCOPY & RADIATIVE TRANSFER, 2009, 110 (9-10) :533-572
[10]  
Ruxton K., 2012, P SPIE, V8537