Effect of preparation technique on the selected characteristics of Zn1-xCoxO nanocrystalline thin films deposited by sol-gel and magnetron sputtering

被引:60
作者
Goktas, A. [1 ,2 ]
Aslan, F. [1 ]
Mutlu, I. H. [3 ]
机构
[1] Harran Univ, Fac Sci & Arts, Dept Phys, TR-63300 Sanliurfa, Turkey
[2] Shimane Univ, Interdisciplinary Fac Sci & Engn, Dept Phys & Mat, Matsue, Shimane 6908504, Japan
[3] Harran Univ, Fac Engn, Dept Elect & Elect Engn, TR-63300 Sanliurfa, Turkey
关键词
Sol-gel; Magnetron sputtering; Zn1-xCoxO nanocrystalline thin films; Optical band gap; Paramagnetic/diamagnetic behavior; ROOM-TEMPERATURE FERROMAGNETISM; OPTICAL-PROPERTIES; ZNO; GROWTH; TRANSPARENT; DEPENDENCE; HYDROGEN; FLOWER;
D O I
10.1016/j.jallcom.2014.06.160
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have investigated structural, optical and magnetic properties of Zn1-xCoxO (0 <= x <= 0.2) nanocrystalline thin films deposited on glass substrates by sal-gel dip coating and reactive radio-frequency magnetron sputtering technique. The effects of the preparation technique and Co doping concentration on the ZnO thin films have been examined. The results reveal that the sol-gel prepared thin films are less c-axis oriented than those of magnetron sputtered thin films. None of the prepared thin films contained secondary phases. With the increase of Co doping concentrations, the crystallite size and orientation degree of the films change in both of the film deposition techniques. The film surfaces with both deposition techniques are homogeneous and dense; the grains on the surface is randomly scattered. Grain size decreases with increasing Co content. With both film deposition techniques, the band gap energy of the films decreases with increasing Co doping ratio and film thickness except for the 9.1 at.% Co doped ZnO magnetron sputtering films. It is found that Co has the valance state of 2+ in ZnO lattice. Considering the magnetic properties, it has been observed that there is a paramagnetic behavior and no ferromagnetic signals over temperature range of 5-300 K for the samples prepared by both of the sol-gel dip coating and magnetron sputtering techniques. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:765 / 778
页数:14
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