High-resolution stereolithography using a static liquid constrained interface

被引:30
作者
Bhanvadia, Aftab A. [1 ]
Farley, Richard T. [2 ]
Noh, Youngwook [2 ]
Nishida, Toshikazu [1 ]
机构
[1] Univ Florida, Dept Elect & Comp Engn Dept, Gainesville, FL 32611 USA
[2] Nanoptics Inc, Gainesville, FL USA
基金
美国国家卫生研究院; 美国国家科学基金会;
关键词
MICRO-STEREOLITHOGRAPHY; OXYGEN; PHOTOPOLYMERIZATION;
D O I
10.1038/s43246-021-00145-y
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
3D printing using conventional stereolithography is challenging because the polymerized layers adhere to the solid constraining interface. The mechanical separation forces lead to poor process reliability and limit the geometrical design space of the printed parts. Here, these challenges are overcome by utilizing a static inert immiscible liquid below the resin as the constraining interface. We elucidate the mechanisms that enable the static liquid to mitigate stiction in both discrete layer-by-layer and continuous layerless growth modes. The inert liquid functions as a dewetting interface during the discrete growth and as a carrier of oxygen to inhibit polymerization during the continuous growth. This method enables a wide range of process conditions, such as exposure and resin properties, which facilitates micrometer scale resolutions and dimensional accuracies above 95%. We demonstrate multi-scale microstructures with feature sizes ranging from 16 mu m to thousands of micrometers and functional devices with aspect ratios greater than 50:1 without using sacrificial supports. This process can enable additive 3D microfabrication of functional devices for a variety of applications. Stiction between polymerized layers and the constraining solid interface during stereolithography limits resolution. Here, a static inert liquid is used as a constraining interface to mitigate stiction, enabling high resolution parts to be fabricated with feature sizes spanning tens to thousands of microns.
引用
收藏
页数:7
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