Elastic and plastic energies in sputtered multilayered Ti-TiN films estimated by nanoindentation

被引:28
|
作者
Kikuchi, N [1 ]
Kitagawa, M [1 ]
Sato, A [1 ]
Kusano, E [1 ]
Nanto, H [1 ]
Kinbara, A [1 ]
机构
[1] Kanazawa Inst Technol, Adv Mat Sci R&D Ctr, Kanazawa, Ishikawa 9240838, Japan
来源
SURFACE & COATINGS TECHNOLOGY | 2000年 / 126卷 / 2-3期
关键词
Ti-TiN multilayered film; nanoindentation; elastic energy; dissipated energy;
D O I
10.1016/S0257-8972(99)00670-2
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Energetic parameters for describing mechanical properties, which makes it possible to discuss deformation behavior of a film elastically and plastically, are presented. Elastic energy and dissipated energy estimated from the area surrounded by a load-displacement curve obtained by nanoindentation measurement indicate the energy to deform a film elastically and plastically. The energy dissipated ratio defined as the ratio of dissipated energy to total applied energy to a film indicates the tendency for plastic deformation of a film. By considering the two energies and the energy dissipated ratio, deformation behavior of compositionally modulated Ti-TiN films with a multilayered structure was examined. At a modulation period of 10 nm, the reduction of the dissipated energy and the energy dissipated ratio were observed. Since the dissipated energy is consistent with energy for the propagation of the dislocations related to plastic deformation, it was assumed that the reduction was caused by a pinning effect for the propagation of the dislocations at interfaces of Ti and TiN. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:131 / 135
页数:5
相关论文
共 50 条
  • [31] Structural and tribological properties of DC reactive magnetron sputtered titanium/titanium nitride (Ti/TiN) multilayered coatings
    Subramanian, B.
    Ananthakumar, R.
    Jayachandran, M.
    SURFACE & COATINGS TECHNOLOGY, 2011, 205 (11): : 3485 - 3492
  • [32] Mechanical properties of Ti(C,N) and TiN thin films on cutting tools measured by nanoindentation
    Lugscheider, E
    Barimani, C
    Lake, M
    FUNDAMENTALS OF NANOINDENTATION AND NANOTRIBOLOGY, 1998, 522 : 311 - 316
  • [33] TISI2 FORMATION DURING ANNEALING OF SPUTTERED TI, TI TIN AND TINX THIN-FILMS
    PANJAN, P
    NAVINSEK, B
    ZABKAR, A
    GODEC, M
    KRIVOKAPIC, Z
    ZALAR, A
    PRACEK, B
    VACUUM, 1990, 40 (1-2) : 169 - 171
  • [34] Evaluation of the elastic-plastic properties of TiN coating by nanoindentation technologies using FEM-reverse algorithm
    He, Guang-yu
    Sun, Dan-yang
    Zang, Shun-lai
    Chen, Jiao
    Fang, Zhi-hao
    SURFACE & COATINGS TECHNOLOGY, 2021, 409
  • [35] Evaluation of the elastic-plastic properties of TiN coating by nanoindentation technologies using FEM-reverse algorithm
    He, Guang-yu
    Sun, Dan-yang
    Zang, Shun-lai
    Chen, Jiao
    Fang, Zhi-hao
    Surface and Coatings Technology, 2021, 409
  • [36] Dependence of diffusion barrier properties in microstructure of reactively sputtered TiN films in Al alloy/TiN/Ti/Si system
    DENSO Corp, Aichi, Japan
    Appl Surf Sci, (308-311):
  • [37] Dependence of diffusion barrier properties in microstructure of reactively sputtered TiN films in Al alloy/TiN/Ti/Si system
    Sobue, S
    Yamauchi, T
    Suzuki, H
    Mukainakano, S
    Takenaka, O
    Hattori, T
    APPLIED SURFACE SCIENCE, 1997, 117 : 308 - 311
  • [38] FORMATION OF TISI2 AND TIN DURING NITROGEN ANNEALING OF MAGNETRON SPUTTERED TI FILMS
    ADAMS, ED
    AHN, KY
    BRODSKY, SB
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06): : 2264 - 2267
  • [39] Volcano reactions in oxide vias between tungsten CVD and bias sputtered TiN/Ti films
    Herner, SB
    Tanaka, Y
    Zhang, H
    Ghanayem, SG
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (05) : 1982 - 1987
  • [40] FORMATION OF TIN BY NITRIDATION OF MAGNETRON SPUTTERED TI-FILMS USING MICROWAVE PLASMA CVD
    MOON, J
    ITO, T
    MA, JS
    HIRAKI, A
    JOURNAL OF CRYSTAL GROWTH, 1991, 115 (1-4) : 589 - 595